• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>Photomask and Next-Generation Lithography Mask Technology XIII pt.2 >FPGA based high-speed system solutions for innovative Maskless Lithography Systems
【24h】

FPGA based high-speed system solutions for innovative Maskless Lithography Systems

机译：用于创新型无掩模光刻系统的基于FPGA的高速系统解决方案

获取原文
获取原文并翻译 | 示例
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Maskless lithography is one of the possible solutions to manage the escalating mask costs and demands for faster production cycles. One of the major issues with the maskless lithography technology however is the management and transfer of the enormous data volumes required to define the chip structures. Ensuring competitive and reliable operation requires dedicated preparation and buffering of the lithography data to be transmitted to the exposure unit. An optimized dedicated architecture and careful signal integrity design for proper functionality are needed due to the high data rates and the highly parallelized system operation. This paper presents the implementation aspects and the design of a high-speed transmission system solution for maskless lithography systems. The introduced solution treats a field programmable gate array (FPGA) based implementation for a latency-sensitive high speed lithography system.
机译：无掩模光刻是管理不断增长的掩模成本和对加快生产周期的要求的可能解决方案之一。然而，无掩模光刻技术的主要问题之一是定义芯片结构所需的大量数据的管理和传输。为确保竞争和可靠的操作，需要专门准备和缓冲要传输到曝光单元的光刻数据。由于高数据速率和高度并行化的系统操作，因此需要优化的专用架构和仔细的信号完整性设计以实现适当的功能。本文介绍了无掩模光刻系统的高速传输系统解决方案的实现方面和设计。引入的解决方案处理了对时延敏感的高速光刻系统的基于现场可编程门阵列（FPGA）的实现。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号