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首页> 外文会议>Photovoltaic Specialists Conference (PVSC), 2011 37th IEEE >Lithography-less high-throughput manufacturing of anechoic silicon nanocone surface for antireflective solar wafer productions
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Lithography-less high-throughput manufacturing of anechoic silicon nanocone surface for antireflective solar wafer productions

机译：用于抗反射太阳能晶片生产的无光刻硅纳米锥表面的无光刻高通量生产

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Owing to the increasing demands for renewable energy in the new millennium, the development of higher efficiency and yet lower cost photovoltaic or solar cell devices is in more and more pressing needs today. The photon absorption rate in the solar spectrum directly affects the overall energy conversion efficiency of solar cells. Photon energy loss on the surface of solar cells is primarily due to the specular and/or diffuse reflection of the light. Anti-reflection coating is commonly used in current solar cell manufacturing in which multilayer dielectric film [1] or nanoparticle sludge [2] is commonly deposited on the silicon solar wafer surface. Not even mentioning the additional high cost associated with the coating process and material, most antireflection coatings are only effective in a relatively narrow spectrum range and may compromise the underlying devices [6]. Micro to sub-micron scale surface texturing or roughening by wet etch and optional photolithography [7] is also used in today''s silicon solar wafer productions, however this expensive step cannot effectively eliminate diffuse reflection and may degrade wafer qualities. Recently various nanomaterial approaches were developed to enhance the optical absorption via creating nanostructures on solar cell surface which includes noble metal nanoplasmonics particles enhancing energy transfer [4] as well as periodical or random 3D nanostructures such as nanowire [8], nanopillar [5], and nanocone [9] arrays “trapping” photons on surface.
机译：由于在新千年中对可再生能源的需求不断增长，当今越来越迫切需要开发效率更高，成本更低的光伏或太阳能电池设备。太阳光谱中的光子吸收率直接影响太阳能电池的整体能量转换效率。太阳能电池表面的光子能量损失主要归因于光的镜面反射和/或漫反射。减反射涂层通常用于当前的太阳能电池制造中，其中多层介电膜[1]或纳米颗粒污泥[2]通常沉积在硅太阳能晶片表面上。甚至没有提及与涂层工艺和材料相关的额外高成本，大多数抗反射涂层仅在相对较窄的光谱范围内有效，并且可能损害下面的设备[6]。今天的硅太阳能晶片生产中也使用了通过湿蚀刻和可选的光刻技术进行的微米级至亚微米级的表面纹理化或粗糙化处理，但是这种昂贵的步骤无法有效消除漫反射并可能降低晶片质量。最近开发了各种纳米材料方法来通过在太阳能电池表面上创建纳米结构来增强光吸收，该结构包括能提高能量传递的贵金属纳米等离激元粒子[4]以及周期性或随机3D纳米结构，例如纳米线[8]，纳米柱[5]，纳米锥[9]阵列将光子“捕获”在表面上。

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