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Fabrication of Cu(In,Ga)Se_2 Thin Film by Selenization of Stacked Elemental Layer with Solid Selenium

机译:固体硒堆积元素层的硒化制备Cu(In,Ga)Se_2薄膜

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Cu(In,Ga)Se_2 thin films were prepared using the classical two-step process approach. In the first step, the metallic precursors were deposited on the soda-lime glass substrates by electron-beam evaporation following the Cu/In/Ga... sequence. The selenization, called the second step, was produced in a rapid thermal processor. This process performed under nitrogen atmosphere of 200 Torr at 200℃ for 5 minutes followed by 500℃ for 3 minutes. The device quality of CIGS film, with the atomic ratios of Cu/(In+Ga) of 0.90 and Ga/(In+Ga) of 0.26, was obtained when the Cu/In/Ga metallic layer had thinness ratio of 900 A/600 A /200 A. The CIGS film with homogeneous and dense surface morphology with large grain size (~ 2 μm) was formed.
机译:采用经典的两步法制备Cu(In,Ga)Se_2薄膜。在第一步中,按照Cu / In / Ga ...顺序通过电子束蒸发将金属前体沉积在钠钙玻璃基板上。硒化被称为第二步,是在快速热处理器中产生的。该过程在200Torr的氮气氛下在200℃下进行5分钟,然后在500℃下进行3分钟。当Cu / In / Ga金属层的薄度比为900 A /时,获得的CIGS膜的器件质量为:Cu /(In + Ga)的原子比为0.90,Ga /(In + Ga)的原子比为0.26。 600 A / 200A。形成具有均匀且致密的表面形貌且晶粒尺寸大(〜2μm)的CIGS膜。

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