首页> 外文会议>Physical Concepts and Materials for Novel Optoelectronic Device Applications II >Modification of heterojunction band offsets at III-V/IV/III-V interfaces
【24h】

Modification of heterojunction band offsets at III-V/IV/III-V interfaces

机译:修改III-V / IV / III-V接口处的异质结带偏移

获取原文
获取原文并翻译 | 示例

摘要

Abstract: We summarize here a systematic investigation of the structural and electronic properties of III-V/IV semiconductor heterojunctions (with IV $EQ Si, Ge, and III-V $EQ GaAs, AlAs) as well as III-V/IV/III-V single and multiple quantum well structures. All structures were fabricated by molecular beam epitaxy and characterized in-situ by reflection high energy electron diffraction and x-ray photoemission spectroscopy, and ex-situ by x-ray diffraction and transmission electron microscopy. We found that relatively abrupt composition profiles and ideal pseudomorphic growth could be achieved through appropriate deposition conditions. Measurements of the band discontinuities indicated that large deviations from the commutativity and transitivity rules of heterojunction band offsets are observed in most of these interfaces. Such deviations demonstrate the dependence of the band discontinuities on the local interface environment and are related, in general, to the establishment of inequivalent local interface environments. !41
机译:摘要:我们在这里总结了对III-V / IV半导体异质结(具有IV $ EQ Si,Ge和III-V $ EQ GaAs,AlAs)和III-V / IV /的结构和电子性质的系统研究III-V单和多量子阱结构。所有结构都是通过分子束外延制造的,并通过反射高能电子衍射和X射线光电子能谱进行原位表征,并通过X射线衍射和透射电子显微镜进行原位表征。我们发现可以通过适当的沉积条件实现相对突然的成分分布和理想的假晶生长。带不连续性的测量表明,在大多数这些界面中观察到与异质结带偏移的可交换性和传递性规则的较大偏差。这种偏差证明了频带不连续性对本地接口环境的依赖性,并且通常与不等价的本地接口环境的建立有关。 !41

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号