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Evaluation of Al_2O_3 Films for MANOS Memory Device with Oxygen Infusion by Gas Cluster Ion Beam

机译:气体团簇离子束对MANOS存储器件氧注入Al_2O_3薄膜的评价

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摘要

Properties of Al_2O_3 as blocking layer of MANOS memory device were investigated and effects of O infusion by GCIB process were discussed. By introduction of GCIB process, electrical properties were improved such as increasing of program window. GCIB process was able to modify film density and band-gap energy, which was limited to several nm from the surface. The variation of band structure induced by the oxygen infusion contributed to the improvement of electrical properties because reduction of electrical field suppressed F-N tunneling during erase operation.
机译:研究了Al_2O_3作为MANOS存储器件阻挡层的性能,并讨论了GCIB工艺对O注入的影响。通过引入GCIB工艺,改善了电性能,例如增加了程序窗口。 GCIB工艺能够改变薄膜密度和带隙能量,该能量仅限于距表面几纳米的位置。由氧注入引起的能带结构的变化有助于电性能的提高,因为电场的减小抑制了擦除操作期间的F-N隧穿。

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  • 来源
  • 会议地点 Boston MA(US);Boston MA(US)
  • 作者单位

    School of Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki, Kanagawa 214-8571, Japan,Research Fellow of the Japan Society for the Promotion of Science, 8 Ichiban-cho, Chiyoda-ku, Tokyo, 102-8472, Japan;

    School of Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki, Kanagawa 214-8571, Japan;

    School of Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki, Kanagawa 214-8571, Japan;

    School of Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki, Kanagawa 214-8571, Japan;

    Japan Synchrotron Radiation Research Institute, 1-1-1, Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan;

    Japan Synchrotron Radiation Research Institute, 1-1-1, Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan;

    Japan Synchrotron Radiation Research Institute, 1-1-1, Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan;

    TOKYO ELECTRON LTD., Yamanashi Regional Office (Hosaka),650 Mitsuzawa, Hosaka-cho, Nirasaki City, Yamanashi 407-0192;

    TOKYO ELECTRON LTD., Yamanashi Regional Office (Hosaka),650 Mitsuzawa, Hosaka-cho, Nirasaki City, Yamanashi 407-0192;

    TEL EPION INC., 37 Manning Road, Billerica, MA 01821, USA;

    TEL EPION INC., 37 Manning Road, Billerica, MA 01821, USA;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 半导体技术;
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