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Development of wet chemical processing in nippon sheet glass

机译:日本平板玻璃湿法化学处理的发展

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摘要

The liquid phase deposition (LPD) is a film coating process developed in Nippon Sheet Glass (NSG). Silica thin film can be grown by an equilibrium reaction in aqueous solution. The formation of silica film on a glass substrate w as found in hexafluorosilisic acid (H2SiF6) solution supersaturated with silica in 1982. The film thus obtaiind showed extremely smooth surface and high density while formed at near room temperature. The LPD has been applied to the process of a manufacturing substrate glass for a liquid crystal display (LCD) since 1986. Recently, another application of the LPD has been proposed in the fabrication process of ULSI circuits. We found organic dye-doped silica films can be a lso prepared by the LPD. NSG has been developing in the various industrial applications.
机译:液相沉积(LPD)是在日本平板玻璃(NSG)中开发的薄膜涂覆工艺。二氧化硅薄膜可以通过在水溶液中的平衡反应来生长。 1982年,在六氟硅酸(H2SiF6)溶液中过氧化硅时,在玻璃基板上形成了氧化硅膜。当在接近室温的条件下形成时,这样的膜显示出极其光滑的表面和高密度。自1986年以来,LPD已应用于制造用于液晶显示器(LCD)的基板玻璃的过程中。最近,LPD已在ULSI电路的制造过程中提出了另一种应用。我们发现有机染料掺杂的二氧化硅薄膜可以由LPD制备。 NSG已经在各种工业应用中发展。

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