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机译:金属和超导体氧化物膜的表观生长

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Non-vacuum electrodeposition was used to prepare biaxially textured Ni coatings on Ni-W and Cu substrates. The samples were characterized by X-ray diffraction (including θ/2θ, pole figures, omega scans, and phi scans), atomic force microscopy (AFM) and scanning electron microscopy. Pole-figure scans show that electrodeposited (ED) Ni on textured Ni-W (3 at%) is 99.3% cube-textured, whereas, ED-Ni on Cu tape is 85% cube-textured. Full width at half maximum values of the ω scan and φ scan of the electrodeposited layers were comparable to the base substrates, indicating good biaxial texturing. AFM studies indicate that ED-Ni has more roughness compared to the base layer. The buffer structures were completed on these types of seed ED-Ni layers by depositing CeO_2/YSZ/Y_2O_3 or LaSrMnO_3 (LSMO). Superconducting properties of YBCO coatings are encouraging, but less than optimal: (a)200-nm pulse layer deposited (PLD) YBCO/CeO_2/YSZ/Y_2O_3/ED-Ni/Ni-W; J_c ~200 kA/cm~2, (b) 300-nm "BaF_2" YBCO/CeO_2/YSZ/ Y_2O_3/ED-Ni/Ni-W; J_c ~ 250 kA/cm~2; (c) 200-nm PLD YBCO/LSMO/ED-Ni/Cu; J_c ~100 kA/cm~2. The superconducting transition temperature (T_c) of YBCO is 91 K, which implies no chemical contamination.
机译:使用非真空电沉积法在Ni-W和Cu基底上制备双轴织构的Ni涂层。通过X射线衍射(包括θ/2θ,极图,Ω扫描和phi扫描),原子力显微镜(AFM)和扫描电子显微镜对样品进行表征。极图扫描显示,在织构化的Ni-W(3 at%)上电沉积的(ED)Ni为99.3%立方体织构,而在Cu胶带上的ED-Ni为85%立方体织构。电沉积层的ω扫描和φ扫描的半峰全宽与基础衬底相当,表明良好的双轴织构。原子力显微镜研究表明,与基层相比,ED-Ni的粗糙度更大。通过沉积CeO_2 / YSZ / Y_2O_3或LaSrMnO_3(LSMO)在这些类型的ED-Ni种子层上完成缓冲结构。 YBCO涂层的超导性能令人鼓舞,但并非最佳:(a)200 nm脉冲层沉积(PLD)YBCO / CeO_2 / YSZ / Y_2O_3 / ED-Ni / Ni-W; J_c〜200 kA / cm〜2,(b)300-nm“ BaF_2” YBCO / CeO_2 / YSZ / Y_2O_3 / ED-Ni / Ni-W; J_c〜250 kA / cm〜2; (c)200纳米PLD YBCO / LSMO / ED-Ni / Cu; J_c〜100 kA / cm〜2。 YBCO的超导转变温度(T_c)为91 K,这意味着没有化学污染。

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