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首页> 外文会议>Rare metals >Influence of deposited temperature on the multi-component (Cr,Ti,Al)N films by ion beam assisted reactive mid-frequency magnetron sputtering
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Influence of deposited temperature on the multi-component (Cr,Ti,Al)N films by ion beam assisted reactive mid-frequency magnetron sputtering

机译：离子束辅助中频磁控溅射沉积温度对多组分（Cr，Ti，Al）N薄膜的影响

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摘要

To improve the service performance of tools and moulds,(Cr,Ti,Al)N multi-composite hard films were deposited by ion beam assisted reactive mid-frequency magnetron sputtering. The energy dispersive spectroscopy (EDS),X-ray diffraction (XRD),trans mission electron microscope(TEM) and micro-hardness tester,scratching tester and scanning electronic microscopy (SEM) had been used to investigate the films composition,microstructure,hardness and adhesive strength. The structure and properties of films and the influence of deposited temperature on the films also had been researched.It is found that (Cr,Ti,Al) N films had been prepared success fully by ion beam assisted reactive mid-frequency magnetron sputtering. The crystal structures were based on fcc structure of CrN and Cr atoms were instead of partial Ti and Al atoms. The films have good comprehensive performance with micro-hardness of 31 GPa,adhesion strength of 80N and resistance to high temperature of 700 ? oxidation above 3 h.With the increase of the deposited temperature,the films composition did not vary within wide limits,the columnar growth became dominated,along(200)grain orientation were intensified,leading to the increase of hardness and the decrease of friction coefficient.However,the adhesion strength of the films decreased.
机译：为了提高工具和模具的使用性能，采用离子束辅助反应中频磁控溅射沉积了（Cr，Ti，Al）N复合硬质膜。用能谱仪（EDS），X射线衍射仪（XRD），透射电子显微镜（TEM），显微硬度计，划痕试验仪和扫描电子显微镜（SEM）研究了薄膜的成分，显微组织，硬度。和粘合强度。研究了薄膜的结构和性能以及沉积温度对薄膜的影响。发现通过离子束辅助反应中频磁控溅射法成功制备了（Cr，Ti，Al）N薄膜。晶体结构基于CrN的fcc结构，Cr原子代替部分Ti和Al原子。该膜具有良好的综合性能，显微硬度为31 GPa，粘合强度为80N，耐高温为700？ 3 h以上氧化。随着沉积温度的升高，膜组成在宽范围内没有变化，柱状生长占主导，沿（200）晶向增强，导致硬度增加和摩擦系数减小但是，膜的粘合强度降低。

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