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首页> 外文会议>Society of Vacuum Coaters Annual Technical Conference; 20050423-28; Denver,CO(US) >Time-resolved Optical Emission Spectroscopy During Pulsed DC Magnetron Sputter Deposition of TiO_2 Thin Films
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Time-resolved Optical Emission Spectroscopy During Pulsed DC Magnetron Sputter Deposition of TiO_2 Thin Films

机译：脉冲直流磁控溅射沉积TiO_2薄膜的时间分辨发射光谱

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摘要

Time-resolved optical emission spectroscopy, a non-intrusive diagnostic method, is applied to analyze pulsed DC magnetron plasmas during the sputter deposition of TiO_2 thin films. The studies are focused on the temporal behavior of the emissions of atomic titanium, argon and oxygen in three chosen spectral regions during the "on-time" and the "reverse-time" of the plasma. Single and double exponential decays of the optical emissions are observed during the reverse period. A slow increase of the optical emissions which follow the conduction current is observed during the start of "on-time". The various time constants can be related to the dynamics of the fast electrons, the Ar metastables, the Ti atoms (metallic mode), and the O atoms (oxide mode).
机译：时间分辨光发射光谱法，一种非侵入式诊断方法，被应用于分析溅射TiO_2薄膜过程中的脉冲直流磁控管等离子体。研究集中于在等离子体的“接通时间”和“反向时间”期间在三个选定的光谱区域中原子钛，氩和氧的发射的时间行为。在反向期间观察到光发射的单指数和双指数衰减。在“导通时间”开始时观察到随传导电流的光发射缓慢增加。各种时间常数可能与快速电子，Ar亚稳态，Ti原子（金属模式）和O原子（氧化物模式）的动力学有关。

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