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A MICROMACHINED PENDULOUS OSCILLATING GYROSCOPICACCELEROMETER

机译:微机械摆式陀螺仪 r n加速度计

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A silicon Pendulous Oscillating GyroscopicrnAccelerometer (POGA) was fabricated using deep reactive ionrnetching (DRIE) and silicon wafer bonding technologies. Thernaccelerometer is composed of three individual layers that arernassembled into the final instrument. The top layer uses waferrnbonding of an oxidized wafer to a handling wafer to create arnsilicon-on-oxide wafer pair, in which the oxide layer providesrnelectrical isolation between the mechanical members and thernhandling layer. The middle layer is a two-gimbal torsionallysupportedrnsilicon structure, and is in turn supported by anrnunderlying drive/sense layer. The instrument proved to havernbetter than milli-g resolution and dynamic ranges in excess ofrnl-g (open loop) and approximately 12 milli-g (closed loop).
机译:使用深反应离子刻蚀(DRIE)和硅晶片键合技术制造了硅摆式陀螺加速度计(POGA)。加速度计由三个独立的层组成,它们被组装成最终的仪器。顶层使用氧化晶片的晶片键合到处理晶片上,以形成氧化硅纳米晶晶片对,其中氧化层在机械构件和处理层之间提供电隔离。中间层是两层扭转支撑的硅结构,依次由底层的驱动/传感层支撑。事实证明,该仪器的分辨率和动态范围均优于Mill-g,超过rnl-g(开环)和约12 Milli-g(闭环)。

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