首页> 外文会议>Symposium on Covalently Bonded Disordered Thin-Film Materials held December 2-4, 1997, Boston, Massachusetts, U.S.A. >Cathodic arc deposition of tetrahedral amorphous carbon: influence of process parameters on microstructure and hardness
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Cathodic arc deposition of tetrahedral amorphous carbon: influence of process parameters on microstructure and hardness

机译:四面体无定形碳的阴极电弧沉积:工艺参数对显微组织和硬度的影响

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摘要

The cathodic arc provides a method for depositing extremely hard thin carbon films. These films are potentially useful in a variety of tribological applications including protection of magnetic media and recording heads. Effective application of this technology requires an improved understanding of the influence of process parameters on the microstructure and hardness of the deposited films. In this work, we use a commercially available filtered cathodic arc to deposit tetrahedral amorphous carbon at several deposition angles.
机译:阴极电弧为沉积极硬的碳薄膜提供了一种方法。这些薄膜可能在包括摩擦介质和记录头保护在内的各种摩擦学应用中很有用。有效应用这项技术需要更好地了解工艺参数对沉积膜的微观结构和硬度的影响。在这项工作中,我们使用市售的过滤阴极电弧以几个沉积角度沉积四面体无定形碳。

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