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首页> 外文会议>Symposium on Microcrystalline and Nanocrystalline Semiconductors-1998 held November 30-December 3, 1998, Boston, Massachusetts, U.S.A. >Nanostructured arrays formed by finely focused ion beams
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Nanostructured arrays formed by finely focused ion beams

机译：由精细聚焦的离子束形成的纳米结构阵列

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摘要

Amorphous, polycrystalline, and single crystal nanometer dimension particles can be formed in a variety of substrates by ion implantation and subsequent annealing. Such composite colloidal materials exhibit unique optical properties that could be useful in optical devices, switches, and waveguides. However colloids formed by blanket implantation are not uniform in size due to the nonuniform density of the implant, resulting in diminution of the size dependent optical properties. The object of the present work is to form more uniform size particles arranged in a 2-dimensional lattice by using a finely focused ion beam to implant identical ion doses only into nanometer size regions located at each point of a rectangular lattice. Initial work is being done with a 30 keV Ga beam implanted into Si. Results of particle formation as a function of implant conditions as analyzed by Rutherford backscattering, x-ray analysis, atomic force microscopy, and both scanning and transmission electron microscopy will be presented and disucssed.
机译：可以通过离子注入和随后的退火在各种衬底中形成非晶，多晶和单晶纳米尺寸的颗粒。这种复合胶体材料具有独特的光学性能，可用于光学设备，开关和波导。然而，由于植入物的密度不均匀，因此通过毯覆式植入形成的胶体在尺寸上是不均匀的，从而导致尺寸依赖性光学性能的降低。本发明的目的是通过使用精细聚焦的离子束将相同的离子剂量仅注入到位于矩形格子的每个点的纳米尺寸区域中来形成排列成二维格子的尺寸更均匀的颗粒。最初的工作是在Si中注入30 keV Ga束。将介绍和讨论通过卢瑟福反向散射，X射线分析，原子力显微镜以及扫描和透射电子显微镜分析的，随植入条件变化而变化的颗粒形成结果。

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