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A study of the origin of band-a emission in homoepitaxial diamond thin films

机译:同质外延金刚石薄膜中能带发射的起源研究

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TRhe band-A emission (around 2.8 eV) observed in high quality (deveice-grade) homoepitaxial diamond films grown by microwave-plasma chemical vapor deposition (CVD) was studied by means of scanning cathodoluminescence spectroscopy and igh-resolution transmission electron microscopy. Recent progress in our study on homoepitaxial damond films was obtained through the low CH_4/H_2 conditions by CVD. These showed atomically flat surfaces and the excitionic emission at room temperature, while the band-A emission (2.95 eV) decreased. Using these samples, we found that the band-A emission only appeared at unepitaxial crystallites (UC) sites, while other lfat surface parts still showed the excitonic emission. High-resolution transmission elecron microscopy revealed that there were grain boundaries which contanined pi -bonds in UC. This indicates that one of the origin of the band-A emission in diamond films is attributed to pi bonds of grain boundaries.
机译:通过扫描阴极发光光谱和高分辨透射电子显微镜研究了通过微波等离子体化学气相沉积(CVD)生长的高质量(设备级)同质外延金刚石膜中观察到的TRhe A带发射(约2.8 eV)。在低CH_4 / H_2条件下,通过CVD获得了我们在同质外延杏仁膜上的研究进展。这些显示出原子平坦的表面和室温下的激发发射,而band A发射(2.95 eV)下降。使用这些样品,我们发现带A发射仅出现在非外延微晶(UC)位置,而其他lfat表面部分仍显示出激子发射。高分辨率透射电子显微镜显示,在UC中存在着含π键的晶界。这表明金刚石膜中A带发射的起源之一归因于晶界的π键。

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