首页> 外文会议>Vertical external cavity surface emitting lasers (VECSELs) III >Investigation of InAs quantum dashes for 1.45 - 2.1 μm VECSEL active regions.
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Investigation of InAs quantum dashes for 1.45 - 2.1 μm VECSEL active regions.

机译:研究1.45-2.1μmVECSEL有源区的InAs量子虚线。

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Lasers with emission wavelength around 2 μm have been traditionally based on InGaSb quantum wells grown on GaSb. An alternative is to use self assembled InAs Quantum Dashes grown on InP by the Stranski-Krastanov growth mode. More specifically, InAs quantum dashes embedded in strained GalnAs quantum wells, grown in InAlGaAs waveguides lattice matched to InP substrates have been successfully used as active medium in edge emitting lasers with wavelengths in the range from 1.45 μm to 2.1 μm. Advantages of this material system compared to the GaSb based system include easier lattice matching; i.e. only one group V element is involved. Many optoelectronic properties of the InAs/InP quantum dash material system are similar to those of InAs quantum dots grown on GaAs substrates. The latter material system has been very successfully used for VECSELs in the wavelength region around 1 μm, leading to the highest power VECSEL at this wavelength, mode locking, wide range tunability as well as intra cavity SHG to generate red light. A challenge in the material system based on InP substrates is to fabricate a DBR. A lattice-matched DBR can consist of GaAsSb/AlAsSb. Alternatively one can grow a metamorphic DBR based on either GaAs/AlAs or GaSb/AlSb. The latter requires the DBR to be grown after the active region. The resultant VECSEL is then a bottom emitter, where the substrate has to be removed. This can be achieved by introducing an etch stop layer between substrate and active region. Lastly, the DBR can be grown separately and subsequently wafer bonded to the active region. This paper will discuss details of these technologies and present results.
机译:传统上,发射波长约为2μm的激光是基于在GaSb上生长的InGaSb量子阱的。一种替代方法是使用通过Stranski-Krastanov生长模式在InP上生长的自组装InAs量子虚线。更具体地,嵌入在应变的GalnAs量子阱中的InAs量子虚线生长在与InP衬底匹配的InAlGaAs波导中,已经成功地用作波长在1.45μm至2.1μm范围内的边缘发射激光器中的活性介质。与基于GaSb的系统相比,该材料系统的优势包括更容易的晶格匹配;即仅涉及一个V组元素。 InAs / InP量子划线材料系统的许多光电特性类似于在GaAs衬底上生长的InAs量子点的光电特性。后者的材料系统已经非常成功地用于1μm波长范围内的VECSEL,从而导致在该波长下具有最高功率的VECSEL,锁模,宽范围可调谐性以及腔内SHG产生红光。基于InP衬底的材料系统中的挑战是制造DBR。晶格匹配的DBR可以由GaAsSb / AlAsSb组成。或者,可以基于GaAs / AlAs或GaSb / AlSb生长变质DBR。后者要求在有源区之后生长DBR。然后,所得的VECSEL是底部发射极,必须在其中除去衬底。这可以通过在衬底和有源区之间引入蚀刻停止层来实现。最后,DBR可以单独生长,然后将晶圆粘合到有源区。本文将讨论这些技术的细节并给出结果。

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