介绍一种全息光刻技术的基本原理，全息掩模复位精度的影响，全息光刻技术的优点及基本应用，并对全息光刻系统的设计考虑作了详细介绍，并给出部分实验结果。%The primary princeple, hologram mask reposition accuracy,advantages and applications of holographic microlithography are described. Some main aspects of holographic microlithography system design are presented. Also some experimental results are given
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