• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Advanced Functional Materials >Hierarchical Directed Self-Assembly of Diblock Copolymers for Modifi ed Pattern Symmetry
【24h】

Hierarchical Directed Self-Assembly of Diblock Copolymers for Modifi ed Pattern Symmetry

机译：改性图案对称性的二嵌段共聚物的分层定向自组装

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Block copolymer lithography exploiting diblock copolymer thin films is promising for scalable manufacture of device-oriented nanostructures. Nonetheless, its intrinsic limitation in the degree of freedom for pattern symmetry within hexagonal dot or parallel line array greatly diminishes the potential application fields. Here, we report multi-level hierarchical self-assembled nano patterning of diblock copolymers for modified pattern symmetry. Sequential hierarchical integration of two layers of diblock copolymer films with judiciously chosen molecular weights and chemical composition creates nanopatterned morphology with modified pattern symmetry, including sparse linear cylinder or lamellar arrays. Internal structure of the hierarchically patterned morphology is characterized by grazing-incidence small-angle X-ray scattering throughout the film thickness. Pattern transfer of the modified nano pattern generates linear metal nanodot array with uniform size and regular spacing as a typical example of functional nanopatterned structures.
机译：利用二嵌段共聚物薄膜的嵌段共聚物光刻技术有望用于可扩展地制造面向器件的纳米结构。但是，它在六边形点或平行线阵列内的图案对称自由度方面的固有局限性大大减小了潜在的应用领域。在这里，我们报告了二嵌段共聚物的多层分层自组装纳米图案，以改进图案对称性。两层具有适当选择的分子量和化学组成的二嵌段共聚物薄膜的顺序分层集成，形成具有改进的图案对称性的纳米图案形态，包括稀疏的线性圆柱体或层状阵列。分层图案化形态的内部结构的特征是在整个膜厚度上都有掠入射小角度X射线散射。改性纳米图案的图案转移产生具有均匀尺寸和规则间隔的线性金属纳米点阵列，作为功能纳米图案结构的典型示例。

著录项

  • 来源
    《Advanced Functional Materials》 |2016年第35期|6462-6470|共9页
  • 作者

    Choi Young Joo; Kim Ju Young; Kim Ji Eun; Mun Jeong Ho; Cha Seung Keun; Kim Sang Ouk;

  • 作者单位

    Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Natl Creat Res Initiat Ctr Multidimens Directed N, 291 Daehak Ro, Daejeon 34141, South Korea;

    Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Natl Creat Res Initiat Ctr Multidimens Directed N, 291 Daehak Ro, Daejeon 34141, South Korea;

    Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Natl Creat Res Initiat Ctr Multidimens Directed N, 291 Daehak Ro, Daejeon 34141, South Korea;

    Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Natl Creat Res Initiat Ctr Multidimens Directed N, 291 Daehak Ro, Daejeon 34141, South Korea;

    Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Natl Creat Res Initiat Ctr Multidimens Directed N, 291 Daehak Ro, Daejeon 34141, South Korea;

    Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Natl Creat Res Initiat Ctr Multidimens Directed N, 291 Daehak Ro, Daejeon 34141, South Korea;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号