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Inductively and capacitively coupled plasmas at interface: A comparative study towards highly efficient amorphous-crystalline Si solar cells

机译:界面处的电感和电容耦合等离子体:高效非晶硅硅太阳能电池的比较研究

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摘要

A comparative study on the application of two quite different plasma-based techniques to the preparation of amorphous/crystalline silicon (a-Si: H/c-Si) interfaces for solar cells is presented. The interfaces were fabricated and processed by hydrogen plasma treatment using the conventional plasma-enhanced chemical vacuum deposition (PECVD) and inductively coupled plasma chemical vapour deposition (ICP-CVD) methods The influence of processing temperature, radio-frequency power, treatment duration and other parameters on interface properties and degree of surface passivation were studied. It was found that passivation could be improved by post-deposition treatment using both ICP-CVD and PECVD, but PECVD treatment is more efficient for the improvement on passivation quality, whereas the minority carrier lifetime increased from 1.65 x 10(-4) to 2.25 x 10(-4) and 3.35 x 10(-4) s after the hydrogen plasma treatment by ICP-CVD and PECVD, respectively. In addition to the improvement of carrier lifetimes at low temperatures, low RF powers and short processing times, both techniques are efficient in band gap adjustment at sophisticated interfaces. (C) 2017 Elsevier B.V. All rights reserved.
机译:提出了两种不同的基于等离子体的技术在制备用于太阳能电池的非晶/晶体硅(a-Si:H / c-Si)界面中的比较研究。通过使用常规等离子体增强化学真空沉积(PECVD)和感应耦合等离子体化学气相沉积(ICP-CVD)方法的氢等离子体处理来制造和处理界面。处理温度,射频功率,处理时间等的影响研究了界面性能和表面钝化度的参数。发现通过使用ICP-CVD和PECVD的沉积后处理可以改善钝化,但是PECVD处理对于改善钝化质量更有效,而少数载流子的寿命从1.65 x 10(-4)增加到2.25分别通过ICP-CVD和PECVD进行氢等离子体处理后的x 10(-4)x和3.35 x 10(-4)s。除了改善低温下的载波寿命,降低射频功率和缩短处理时间外,这两种技术都可以有效地改善复杂接口的带隙。 (C)2017 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Applied Surface Science》 |2018年第ptab期|486-493|共8页
  • 作者单位

    Nanyang Technol Univ, NIE, Plasma Sources & Applicat Ctr, Singapore 637616, Singapore|Plasma Innovat Labs Pte Ltd, Innovat Ctr, 18 Nanyang Dr,02-235, Singapore 637723, Singapore;

    Nanyang Technol Univ, NIE, Plasma Sources & Applicat Ctr, Singapore 637616, Singapore|Innovis, A STAR, Inst Mat Res & Engn, 2 Fusionopolis Way,08-03, Singapore 138634, Singapore;

    Nanyang Technol Univ, NIE, Plasma Sources & Applicat Ctr, Singapore 637616, Singapore|Queensland Univ Technol, Sch Chem Phys & Mech Engn, Brisbane, Qld 4000, Australia;

    Nanyang Technol Univ, NIE, Plasma Sources & Applicat Ctr, Singapore 637616, Singapore;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Solar cells; Plasma;

    机译:太阳能电池;等离子;

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