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Surface nanopatterning of Al/Ti multilayer thin films and Al single layer by a low-fluence UV femtosecond laser beam

机译:低能流飞秒紫外激光对Al / Ti多层薄膜和Al单层的表面纳米构图

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The effects of UV femtosecond laser beam with 76 MHz repetition rate on two types of thin films on Si substrate - the Al single layer thin film, and the multilayered thin film consisted of five Al/Ti bilayers (total thickness 130 nm) - were studied. The surface modification of the target was done by low fluences and different irradiation times, not exceeding ~300 s. Nanopatterns in the form of femtosecond-laser induced periodic surface structures (fs-LIPSS) with periodicity of <315 nm and height of ~45 nm were registered upon irradiation of the thin films. It was shown that: (ⅰ) the fs-LIPSS evolve from ruffles similar to high spatial frequency LIPSS (HSFL) into a low spatial frequency LIPSS (LSFL) if a certain threshold of the fluence is met, (ⅱ) the number of LSFL increases with the exposition time and (ⅲ) the LSFL remain stable even after long exposure times. We achieved high-quality highly-controllable fabrication of periodic structures on the surface of nanosized multilayer films with high-repetition-rate low-fluence femtosecond laser pulses. Compared to the Al single layer, the presence of the Ti underlayer in the Al/Ti multilayer thin film enabled more efficient heat transmittance through the Al/Ti interface away from the interaction zone which caused the reduction of the ablation effects leading to the formation of more regular LIPSS. The different outcomes of interactions with multi and single layer thin films lead to the conclusion that the behavior of the LIPSS is due to thin film structure.
机译:研究了重复频率为76 MHz的紫外飞秒激光束对Si基片上两种类型的薄膜-Al单层薄膜和由五个Al / Ti双层(总厚度130 nm)组成的多层薄膜的影响。目标的表面修饰是通过低能量密度和不同的照射时间完成的,不超过〜300 s。飞秒激光诱导的周期性表面结构(fs-LIPSS)形式的纳米图案在薄膜辐照时记录,其周期性<315 nm,高度〜45 nm。结果表明:(ⅰ)如果满足一定的通量阈值,fs-LIPSS从类似于高空间频率LIPSS(HSFL)的褶皱演变为低空间频率LIPSS(LSFL),(ⅱ)LSFL的数量(ⅲ)LSFL即使经过长时间曝光也保持稳定。我们使用高重复率低通量飞秒飞秒激光脉冲,在纳米多层膜的表面上实现了高质量,可控的周期性结构制造。与Al单层相比,Al / Ti多层薄膜中Ti底层的存在使Al / Ti界面更有效地传热,使Al / Ti界面远离相互作用区域,从而导致了烧蚀效果的降低,从而导致形成Al。更常规的LIPSS。与多层和单层薄膜相互作用的不同结果得出结论,即LIPSS的行为是由于薄膜结构所致。

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