Structure and hardness of a-C:H films prepared by middle frequency plasma chemical vapor deposition

著录项

• 来源
  《Applied Surface Science》 |2011年第10期|p.4738-4742|共5页
• 作者

  Guangwei Guo; Guangze Tang; Yajun Wang; Xinxin Ma; Mingren Sun; Liqin Wang; Ken Yukimura;

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• 作者单位

  State Key Laboratory of Advanced Welding Production Technology, Harbin Institute of Technology, Harbin 150001, China School of Mechanical Science and Engineering, Northeast Petroleum University, Daqing 163318, China;

  National Key Laboratory of Science and Technology on Precision Hot Processing of Metals Harbin Institute of Technology, Harbin 150001, China School of Mechatronics Engineering, Harbin Institute of Technology, Harbin 150001, China;

  School of Material Science & Engineering, Harbin Institute of Technology, Harbin 150001, China;

  State Key Laboratory of Advanced Welding Production Technology, Harbin Institute of Technology, Harbin 150001, China;

  National Key Laboratory of Science and Technology on Precision Hot Processing of Metals Harbin Institute of Technology, Harbin 150001, China;

  School of Mechatronics Engineering, Harbin Institute of Technology, Harbin 150001, China;

  School of Material Science & Engineering, Harbin Institute of Technology, Harbin 150001, China;

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• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  a-C:H films; MF-PCVD; Structure; Hardness; Elastic modulus;

  机译：a-C：H胶片;MF-PCVD;结构体;硬度;弹性模量;