机译:SiO_2缓冲层对钠钙玻璃上Al掺杂ZnO薄膜电学和结构性能的影响
Department of Electric Science and Technology, Huazhong University of Science and Technology, Wuhan 430074, China;
Department of Electric Science and Technology, Huazhong University of Science and Technology, Wuhan 430074, China;
Department of Electric Science and Technology, Huazhong University of Science and Technology, Wuhan 430074, China;
Department of Electric Science and Technology, Huazhong University of Science and Technology, Wuhan 430074, China;
Department of Electric Science and Technology, Huazhong University of Science and Technology, Wuhan 430074, China;
Department of Electric Science and Technology,Huazhong University of Science and Technology, No. 1037, Luoyu Road, Hongshan District, Wuhan 430074, China;
al doped zinc oxide; transparent conducting film; sputtering; soda lime glass; buffer layer;
机译:通过使用超薄铝基底层增强沉积在ZnO缓冲玻璃基板上的Al掺杂ZnO膜的电性能
机译:评述“原子层沉积铝掺杂ZnO薄膜的结构和电学性质”
机译:原子层沉积铝掺杂ZnO薄膜的结构和电学性质
机译:厚度对RF磁控溅射沉积的铝掺杂ZnO膜结构,电和光学性质的影响
机译:锡对钠钙硅酸盐玻璃组成,结构和性能之间关系的影响。
机译:Zr掺杂对原子层沉积ZnO薄膜光学电学和微结构性质的影响
机译:由原子层沉积沉积的铝掺杂ZnO膜的电气和光学性质