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Diamond-like carbon films deposited by a hybrid ECRCVD system

机译:通过混合ECRCVD系统沉积的类金刚石碳膜

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摘要

A novel hybrid technique for diamond-like carbon (DLC) film deposition has been developed. This technique combines the electron cyclotron resonance chemical vapor deposition (ECRCVD) of C_2H_2 and metallic magnetron sputtering. Here we described how DLC film is used for a variety of applications such as stamper, PCB micro-tools, and threading form-tools by taking advantage of hybrid ECRCVD system. The structure of the DLC films is delineated by a function of bias voltages by Raman spectroscopy. This function includes parameters such as dependence of G peak positions and the intensity ratio (I_D/I_G). Atomic force microscope (AFM) examines the root-mean-square (R.M.S.) roughness and the surface morphology. Excellent adhesion and lower friction coefficients of a DLC film were also assessed.
机译:已开发出一种用于类金刚石碳(DLC)膜沉积的新型混合技术。该技术结合了C_2H_2的电子回旋共振化学气相沉积(ECRCVD)和金属磁控溅射。在这里,我们介绍了如何利用混合ECRCVD系统将DLC膜用于各种应用,例如压模,PCB微型工具和螺纹成型工具。 DLC膜的结构通过拉曼光谱法通过偏置电压的函数来描绘。该函数包括诸如G峰位置和强度比(I_D / I_G)的依赖性之类的参数。原子力显微镜(AFM)检查均方根(R.M.S.)粗糙度和表面形态。还评估了DLC膜的优异附着力和较低的摩擦系数。

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