Thin Film Deposition on Plastics by ECR Plasma

Hiroaki Tamamaki; Masaya Nomura; Keiichiro Sano

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Thin Film Deposition on Plastics by ECR Plasma

机译：通过ECR等离子在塑料上进行薄膜沉积

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Deposition of hard coatings on automobile plastics is required to improve the hardness, external appearance and the weatherability of the plastic surface. In the present investigation, SiO_2 thin films were deposited on polycarbonate (PC) and polypropylene (PP) by ECR-PECVD(electron cyclotron resonance- plasma enhanced chemical vapor deposition) using TEOS (tetraethoxysilane) source.

机译：需要在汽车塑料上沉积硬质涂层以改善塑料表面的硬度，外观和耐候性。在本研究中，使用TEOS（四乙氧基硅烷）源通过ECR-PECVD（电子回旋共振-等离子体增强化学气相沉积）在聚碳酸酯（PC）和聚丙烯（PP）上沉积SiO_2薄膜。

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来源
《自動車技術》 |1997年第5期|p.81-87|共7页
作者
Hiroaki Tamamaki; Masaya Nomura; Keiichiro Sano;
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作者单位

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收录信息美国《科学引文索引》(SCI);
原文格式 PDF
正文语种 jpn
中图分类汽车工程;
关键词
surface treatment; plastic; weather resistance/chemical analysis;

机译：表面处理;塑料;耐候性/化学分析;

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专利

1. Deposition of copper thin films by plasma enhanced pulsed chemical vapor deposition for metallization of carbon fiber reinforced plastics [J] . Guo Zheng, Sang Lijun, Wang Zhengduo, Surface & Coatings Technology . 2016,第Pta2期

机译：等离子体增强脉冲化学气相沉积法沉积铜薄膜，用于碳纤维增强塑料的金属化
2. Deposition of copper thin films by plasma enhanced pulsed chemical vapor deposition for metallization of carbon fiber reinforced plastics [J] . Guo Zheng, Sang Lijun, Wang Zhengduo, Surface & Coatings Technology . 2016,第Pta2期

机译：等离子体增强脉冲化学气相沉积法沉积铜薄膜，用于碳纤维增强塑料的金属化
3. Plasma parameter measurements and deposition of a-Si:H thin films in pulsed ECR plasma [J] . N. Itagaki, A. Fukuda, T. Yoshizawa, Surface & Coatings Technology . 2000,第1a3期

机译：脉冲ECR等离子体中的等离子体参数测量和a-Si：H薄膜沉积
4. Deposition of dense SiO2 thin films for electrical insulation applications by microwave ECR plasma source enhanced RF reactive magnetron sputtering [C] . Qiyong Zeng, Xiaofeng Zheng, Zhonghua Yu, 2010 International Conference on Measuring Technology and Mechatronics Automation . 2010

机译：微波ECR等离子体源增强的RF反应磁控溅射沉积用于电绝缘应用的致密SiO2薄膜
5. Plasma enhanced chemical vapor deposition of silicon thin films: Characterization of film growth at different frequencies and gas compositions utilizing plasma diagnostics. [D] . Zhu, Lala. 2014

机译：等离子体增强了硅薄膜的化学气相沉积：利用等离子体诊断技术表征不同频率和气体成分下的薄膜生长。
6. Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films [O] . Mateusz Œmietana, Robert Mroczyński, Norbert Kwietniewski 2014

机译：射频等离子体增强化学气相沉积（RF PECVD）反应器中样品高度对氮化硅薄膜光学性能和沉积速率的影响
7. Characteristics of the plasma created by ECR plasma source for thin films deposition [O] . Fedorchenko V.D., Byrka O.V., Chebotarev V.V., 2005

机译：由ECR等离子体源产生的用于薄膜沉积的等离子体的特性

Thin Film Deposition on Plastics by ECR Plasma

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