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首页> 外文期刊>Chinese journal of aeronautics >Microstructure and Optical Characterization of Magnetron Sputtered NbN Thin Films
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Microstructure and Optical Characterization of Magnetron Sputtered NbN Thin Films

机译：磁控溅射NbN薄膜的微观结构和光学特性

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摘要

Some fundamental studies on the preparation, structure and optical properties of NbN films were carried out. NbN thin films were deposited by DC reactive magnetron sputtering at different N_2 partial pressures and different substrate temperatures ranging from -50℃ to 600℃. X-ray diffraction analysis (XRD) and scanning electron microscopy (SEM) were employed to characterize their phase components, microstructures, grain sizes and surface morphology. Optical properties inclusive of refractive indexes, extinction coefficients and transmittance of the NbN films under different sputtering conditions were measured. With the increase in the N_2 partial pressure, δ-NbN phase structure gets forming and the grain size and lattice constant of the cubic NbN increasing. The deposited NbN film has relatively high values of refractive index and extinction coefficient in the wavelength ranging from 240 run to 830 nm. Substrate temperature exerts notable influences on the microstructure and optical transmittance of the NbN films. The grain sizes of the δ-NbN film remarkably increase with the rise of the substrate temperature, while the transmittance of the films with the same thickness decreases. Ultra-fine granular film with particle size of several nanometers forms when the substrate is cooled to -50℃, and a remarkable augmentation of transmittance could be noticed under so low a temperature.
机译：对NbN薄膜的制备，结构和光学性质进行了一些基础研究。直流反应磁控溅射法在不同的N_2分压和不同的衬底温度（-50℃至600℃）下沉积NbN薄膜。 X射线衍射分析（XRD）和扫描电子显微镜（SEM）被用来表征它们的相成分，微观结构，晶粒尺寸和表面形态。测量了不同溅射条件下NbN薄膜的折射率，消光系数和透射率等光学性质。随着N_2分压的增加，形成δ-NbN相结构，立方NbN的晶粒尺寸和晶格常数增大。所沉积的NbN膜在240nm至830nm的波长范围内具有相对较高的折射率和消光系数值。衬底温度对NbN薄膜的微观结构和透光率产生显着影响。 δ-NbN膜的晶粒尺寸随着基板温度的升高而显着增加，而相同厚度的膜的透射率则降低。当基板冷却至-50℃时，会形成几纳米大小的超细颗粒膜，在如此低的温度下，可以看到透射率显着增加。

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