Fabrication of polyimide sacrificial layers with inclined sidewalls based on reactive ion etching

Yuanjing Chen; Haiyang Mao; Qiulin Tan; Chenyang Xue; Wen Ou; Jin Liu; Dapeng Chen

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Fabrication of polyimide sacrificial layers with inclined sidewalls based on reactive ion etching

机译：基于反应离子刻蚀的具有倾斜侧壁的聚酰亚胺牺牲层的制备

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Polyimide is used as a sacrificial material because of its low stress, its removable ability and its compatibility with standard micromachining processes. In this work, polyimide structures with inclined sidewalls are fabricated with a reactive ion etching process, where SiO2 is used as the hard-mask material. The structures can be further used as sacrificial layers in micro-electro-mechanical systems infrared (IR) sensors to support IR absorbers, to realize the thermal connections between the absorbers and the thermopiles, and to scale down the size of the sensors. As a result, IR sensors with low-residual-stress absorption, high structural stability, low heat loss and small dimensions can be achieved.

机译：聚酰亚胺由于其低应力，可移除能力以及与标准微加工工艺的兼容性而被用作牺牲材料。在这项工作中，采用反应离子刻蚀工艺制造了具有倾斜侧壁的聚酰亚胺结构，其中SiO2被用作硬掩模材料。该结构还可以用作微机电系统红外（IR）传感器中的牺牲层，以支撑IR吸收器，实现吸收器和热电堆之间的热连接，并缩小传感器的尺寸。结果，可以获得具有低残余应力吸收，高结构稳定性，低热损失和小尺寸的IR传感器。

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《AIP Advances》 |2014年第3期|共页
作者
Yuanjing Chen; Haiyang Mao; Qiulin Tan; Chenyang Xue; Wen Ou; Jin Liu; Dapeng Chen;
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1. Fabrication of GaN-based LEDs with 22° undercut sidewalls by inductively coupled plasma reactive ion etching [J] . Wang Bo, Su Shi-Chen, He Miao, 中国物理：英文版 . 2013,第010期

机译：通过感应耦合等离子体反应离子刻蚀制造具有22°底切侧壁的GaN基LED
2. In-plane silicon microneedles with open capillary microfluidic networks by deep reactive ion etching and sacrificial layer based sharpening [J] . Li Yan, Zhang Hang, Yang Ruifeng, Sensors and Actuators, A. Physical . 2019,第期

机译：通过深度反应离子蚀刻和基于牺牲层的平面内硅片微流体与开放的毛细管微流体网络
3. Fabrication of covalently crosslinked and amine-reactive microcapsules by reactive layer-by-layer assembly of azlactone-containing polymer multilayers on sacrificial microparticle templates [J] . Eric M. Saurer, Ryan M. Flessner, Maren E. Buck Journal of Materials Chemistry: An Interdisciplinary Journal dealing with Synthesis, Structures, Properties and Applications of Materials, Particulary Those Associated with Advanced Technology . 2011,第6期

机译：通过牺牲微粒模板上含氮杂内酯聚合物多层的反应性逐层组装，制备共价交联和具有胺反应性的微囊
4. Fabrication of a Real Time Reactive Ion Etching Resonant Sensor Using a Low Temperature Sacrificial Polymer [C] . B.G. Morris, P.J. Joseph, G.S. May Nano Science and Technology Institute(NSTI) Nanotechnology Conference and Trade Show(NSTI Nanotech 2007) vol.3; 20070520-24; Santa Clara,CA(US) . 2007

机译：使用低温牺牲聚合物的实时反应离子蚀刻共振传感器的制作
5. A study of the etching and surface modification characteristics of polyimide films for use as a dielectric layer in multi-chip modules. [D] . Mannarino, Matthew Marchand. 2008

机译：对用作多芯片模块介电层的聚酰亚胺薄膜的蚀刻和表面改性特性的研究。
6. Fabrication of Covalently Crosslinked and Amine-Reactive Microcapsules by Reactive Layer-by-Layer Assembly of Azlactone-Containing Polymer Multilayers on Sacrificial Microparticle Templates [O] . Eric M. Saurer, Ryan M. Flessner, Maren E. Buck, -1

机译：共价交联和胺活性的制作通过吖内酯 - 含反应层与层之间的微胶囊大会聚合物多层膜在牺牲微粒模板
7. Fabrication of polyimide sacrificial layers with inclined sidewalls based on reactive ion etching [O] . Yuanjing Chen, Haiyang Mao, Qiulin Tan, 2014

机译：基于反应离子蚀刻制备具有倾斜侧壁的牺牲聚酰亚胺层

Fabrication of polyimide sacrificial layers with inclined sidewalls based on reactive ion etching

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