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Effect of Substrate Temperature on Structural and Optical Properties of Au/SiO2 Nanocomposite Films Prepared by RF Magnetron Sputtering

机译:衬底温度对射频磁控溅射制备Au / SiO2纳米复合薄膜结构和光学性能的影响

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Silica films containing gold nanoparticles were grown by magnetron radio frequency (rf) sputtering technique under various deposition conditions. The structural and optical properties of the composite films deposited at 400℃ substrate temperature were compared with those deposited at room temperature. Effect of substrate temperature of AuNPs on micro structural properties of the Au/SiO 2) nanocomposite films, such as size, dislocation density ( δ ), strain ( ε ) and lattice distortion (LD) have been investigated. The face-centered cubic crystalline structure of Au nanoparticles inclusion in the amorphous silica die lectric matrix was confirmed using X-ray diffraction. The average grain size of AuNPs has been found in the range of 0.56 - 0.60 nm and 1.15 - 1.23 nm at 3 × 10 ﹣3) mbar and 2 × 10 ﹣3) mbar argon pressure respectively. The δ , ε , LD values change inversely with the increasing of the substrate temperatures. These composites exhibit the optical features of a semiconductor with direct band gap. The band gap energy of 3.85 eV and 4.1 eV achieved for gold nanoparticles when the substrate temperatures increases from 25℃ to 400℃. A peak wavelength of the surface plasmon resonance band absorption (SPR) characteristic of gold nanoparticle was found around 500 nm for the sample deposited at 2 × 10 ﹣3) mbar and at 400℃ substrate temperature.
机译:通过磁控管射频(rf)溅射技术在各种沉积条件下生长包含金纳米颗粒的二氧化硅膜。比较了在400℃衬底温度下沉积的复合膜与在室温下沉积的复合膜的结构和光学性质。研究了AuNPs的衬底温度对Au / SiO 2)纳米复合薄膜微观结构性能的影响,例如尺寸,位错密度(δ),应变(ε)和晶格畸变(LD)。使用X射线衍射证实了无定形二氧化硅管芯电基质中包含的Au纳米颗粒的面心立方晶体结构。在3×10 ﹣3)mbar和2×10 ﹣3)mbar氩气​​压力下,AuNPs的平均晶粒尺寸分别在0.56-0.60 nm和1.15-1.23 nm范围内。 δ,ε,LD值随衬底温度的升高成反比。这些复合材料表现出具有直接带隙的半导体的光学特征。当基底温度从25℃升高到400℃时,金纳米颗粒的带隙能达到3.85 eV和4.1 eV。在2×10 ﹣3)mbar和400℃的衬底温度下沉积的样品,发现金纳米粒子的表面等离振子共振带吸收(SPR)特性的峰值波长约为500 nm。

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