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Threshold voltage instability at low temperatures in partially depleted thin-film SOI MOSFETs

机译:部分耗尽的薄膜SOI MOSFET在低温下的阈值电压不稳定性

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摘要

A threshold voltage instability phenomenon at low temperatures in partially depleted thin-film silicon-on-insulator (SOI) SIMOX (separation by implantation of oxygen) MOSFETs is reported. This phenomenon was investigated under normal MOSFET operating conditions for temperatures ranging from 300 K down to 10 K, with both the magnitude and duration of the instability observed to be strongly dependent on temperature. Threshold voltage shifts as small as 0 V at room temperature and as large as 0.29 V at 10 K are reported. The duration of the instability ranged in the tens of minutes and was observed to increase as the temperature was decreased.
机译:据报道,在部分耗尽的绝缘体上薄膜硅(SOI)SIMOX(通过注入氧进行分离)MOSFET中,在低温下存在阈值电压不稳定性现象。在300 K至10 K的正常MOSFET工作条件下对这种现象进行了研究,观察到的不稳定程度和持续时间都与温度密切相关。据报道,在室温下阈值电压偏移小至0 V,而在10 K时阈值电压大至0.29V。不稳定的持续时间在数十分钟内,并且观察到随着温度降低而增加。

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