Sputter Depth Profiling of Thin Films

Siefried Hofmann

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Sputter Depth Profiling of Thin Films

机译：薄膜的溅射深度分析

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An outline of the fundamental principles of compositional depth profiling of thin films by sputtering is given, emphasizing first the importance of optimized experimental conditions in obtaining high resolution depth profiles, in particular sample rotation and low energy primary ions. Based on former and recent developments, the basic approach to profile evaluation and to quantification is briefly reviewed. The fundamental roles of depth resolution and of the depth resolution function are elucidated, including experi- mental determination and theoretical modeling of the latter by the three fundamental parameters atomic mixing, surface roughness and information depth (MRI-model). Typical application examples for profile reconstruction in depth profiling are presented.

机译：给出了通过溅射的薄膜组成深度轮廓分析的基本原理的概述，首先强调了优化实验条件对于获得高分辨率深度轮廓（特别是样品旋转和低能初级离子）的重要性。基于以前和最近的发展，简要回顾了轮廓评估和量化的基本方法。阐明了深度分辨率和深度分辨率功能的基本作用，包括通过原子混合，表面粗糙度和信息深度（MRI模型）这三个基本参数进行的实验确定和理论建模。介绍了深度剖析中的轮廓重建的典型应用示例。

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《High Temperature Materials and Processes》 |1998年第2期|p.13-28|共16页
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Siefried Hofmann;
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正文语种 eng
中图分类金属学与热处理;
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1. Improved sputter depth resolution in Auger composition-depth profiling of polycrystalline thin film systems using single grain depth profiling [J] . Scheithauer U Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films . 2007,第1期

机译：使用单晶粒深度剖析改善多晶薄膜系统俄歇成分深度剖析中的溅射深度分辨率
2. Non-uniform sputtering and degradation of depth resolution during GDOES depth profiling analysis of thin anodic alumina films grown over rough substrates [J] . Shimizu K., Skeldon P., Thompson G.E., Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films . 1999,第10期

机译：在粗糙基底上生长的阳极氧化铝薄膜的GDOES深度轮廓分析过程中，溅射不均匀且深度分辨率降低
3. Quantitative evaluation of sputtering induced surface roughness and its influence on AES depth profiles of polycrystalline Ni/Cu multilayer thin films [J] . Yan X. L., Coetsee E., Wang J. Y., Applied Surface Science . 2017,第JULa31期

机译：溅射引起的表面粗糙度的定量评估及其对多晶Ni / Cu多层薄膜的AES深度分布的影响
4. Considerable Improvement of Depth Resolution in Auger Sputter Depth Profiling of Polycrystalline Thin Films Using In-situ Sample Preparation Methods [C] . U. Scheithauer Analytical techniques for semiconductor materials and process characterization 6(ALTECH 2009) . 2009

机译：使用原位样品制备方法显着提高多晶薄膜俄歇溅射深度剖析中的深度分辨率
5. Depth profiling residual stresses in thin tungsten films using x-ray diffraction. [D] . Ely, Thomas M. 1999

机译：使用X射线衍射分析钨薄膜中的深度轮廓残余应力。
6. XPS Depth Profile Analysis of Zn3N2 Thin Films Grown at Different N2/Ar Gas Flow Rates by RF Magnetron Sputtering [O] . M. Baseer Haider 2017

机译：射频磁控溅射在不同N2 / Ar气体流量下生长的Zn3N2薄膜的XPS深度剖面分析
7. Dependence of depth resolution on sputtering ion species and energy in Auger sputter depth profiling analysis of gallium arsenide/aluminium arsenide films. [O] . Toshiya OGIWARA, Shigeo TANUMA, Misao TAKAKUSAGI 1990

机译：深度分辨率对溅射离子物种和罐溅射深度分析中砷化镓/铝砷膜溅射深度分析分析的依赖性。
8. X-ray Photoelectron Spectroscopy Sputter Depth Profile Analysis of SpatiallyControlled Microstructures in Conductive Polymer Films [R] . MacKay, S. G., Bakir, M., Musselman, I. H., 1991

机译：导电聚合物薄膜中空间控制微结构的X射线光电子能谱溅射深度剖面分析

Sputter Depth Profiling of Thin Films

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