Irradiation Effect of N and Ar Ions in the Synthesis of C-N Thin Films by Ion-beam-assisted Deposition Technique

Hidenobu Ohta; Akihito Matsumuro; Yutaka Takahashi

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Irradiation Effect of N and Ar Ions in the Synthesis of C-N Thin Films by Ion-beam-assisted Deposition Technique

机译：离子束辅助沉积技术在合成C-N薄膜中N和Ar离子的辐照效应

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Simultaneous irradiation of Ar ion is often employed to synthesize C-N films by ion-beam-assisted deposition. To clarify individual roles of N ion(reactive) and Ar ion(inert), films were prepared on Si(001) substrates, such as only C deposited (Carbon film), C evaporated in the atmosphere of 4 x 10~-2 Pa of N_2(Carbon/N), C evaporated under the simultaneous irradiation of Ar ion (Carbon/Ar~+), co-evaporated C and N (C-N), and co-evaporated C and N under the irradiation of Ar ion (C-N/Ar~+).

机译：通常通过离子束辅助沉积同时照射Ar离子来合成C-N膜。为了阐明N离子（反应性）和Ar离子（惰性）的各个作用，在Si（001）衬底上制备了膜，例如仅沉积了C（碳膜），C在4 x 10〜-2 Pa的气氛中蒸发N_2（碳/ N），同时在Ar离子（Carbon / Ar〜+）照射下蒸发的C，共同蒸发的C和N（CN）和在Ar离子（CN）照射下共同蒸发的C和N / Ar〜+）。

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《精密工学会誌》 |2001年第11期|p.1866-1870|共5页
作者
Hidenobu Ohta; Akihito Matsumuro; Yutaka Takahashi;
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原文格式 PDF
正文语种 jpn
中图分类机械制造工艺;仪器、仪表;
关键词
ion-beam-assisted deposition; carbon nitride thin film; mechanical property;

机译：离子束辅助沉积;氮化碳薄膜机械性能;

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1. Irradiation Effect of N and Ar Ions in the Synthesis of C-N Thin Films by Ion-beam-assisted Deposition Technique [J] . Hidenobu Ohta, Akihito Matsumuro, Yutaka Takahashi 精密工学会誌 . 2001,第11期

机译：离子束辅助沉积C-N薄膜合成中N和Ar离子的辐照效应
2. Wear Resistance of C-N Thin Films Prepared by Ion-Beam-Assisted Deposition [J] . Toshiyuki HAYASHI, Akihito MATSUMURO, Mutsuo MURAMATSU 日本機械学会論文集. C編 . 1999,第633期

机译：离子束辅助沉积制备的C-N薄膜的耐磨性
3. A study of nanostructures of thin films in B-C-N system produced by pulsed laser deposition and nitrogen ion-beam-assisted pulsed laser deposition [J] . S. Bysakh, K. Chattopadhyay, H. Ling Journal of Materials Research . 2004,第3期

机译：脉冲激光沉积和氮离子束辅助脉冲激光沉积产生的B-C-N体系薄膜的纳米结构研究
4. DEPOSITION OF AMORPHOUS C-N THIN FILMS BY PULSED LASER DEPOSITION UNDER NITROGEN RADICAL BEAM IRRADIATION [C] . Yoshifumi Aoi, Kojiro Ono, Kunio Sakurada, Sixth International Symposium on Diamond Materials, 6th, Oct 17-22, 1999, Honolulu, Hawaii . 1999

机译：氮束流辐照脉冲激光沉积非晶C-N薄膜。
5. Synthesis of novel materials by pulsed laser deposition and chemical vapor deposition: Part I: Energetic deposition and stability of carbon nitride thin films. Part II: Catalytic growth of one dimensional materials and devices. [D] . Hu, Jiangtao. 2000

机译：通过脉冲激光沉积和化学气相沉积合成新型材料：第一部分：氮化碳薄膜的能量沉积和稳定性。第二部分：一维材料和装置的催化生长。
6. Composition and crystalline properties of TiNi thin films prepared by pulsed laser deposition under vacuum and in ambient Ar gas [O] . Jeong Ok Cha, Tae Hyun Nam, Mohammad Alghusun, 2012

机译：在真空和环境氩气中通过脉冲激光沉积制备的TiNi薄膜的组成和晶体性质
7. Irradiation Effect of N and Ar Ions in the Synthesis of C-N Thin Films by Ion-beam-assisted Deposition Technique. [O] . Hidenobu OHTA, Akihito MATSUMURO, Yutaka TAKAHASHI 2001

机译：离子梁辅助沉积技术N和Ar离子在C-N薄膜合成中的辐照效应。
8. Stoichiometry and Characterization of Aluminum Oxynitride Thin Films by Ion-Beam-Assisted Pulsed Laser Deposition (Preprint) [R] . Zabinski, J. S. , Hu, J. J. , Bultman, J. E. , 2007

机译：离子束辅助脉冲激光沉积（预印）氧化铝薄膜的化学计量和表征

Irradiation Effect of N and Ar Ions in the Synthesis of C-N Thin Films by Ion-beam-assisted Deposition Technique

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