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Computational study on UV curing characteristics in nanoimprint lithography: Stochastic simulation

机译：纳米压印光刻中紫外线固化特性的计算研究：随机模拟

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摘要

A computational simulation model of UV curing in nanoimprint lithography based on a simplified stochastic approach is proposed. The activated unit reacts with a randomly selected monomer within a critical reaction radius. Cluster units are chained to each other. Then, another monomer is activated and the next chain reaction occurs. This process is repeated until a virgin monomer disappears within the reaction radius or until the activated monomers react with each other. The simulation model well describes the basic UV curing characteristics, such as the molecular weight distributions of the reacted monomers and the effect of the initiator concentration on the conversion ratio. The effects of film thickness on UV curing characteristics are also studied by the simulation. (C) 2017 The Japan Society of Applied Physics
机译：提出了一种基于简化随机方法的纳米压印光刻中UV固化的计算仿真模型。活化的单元在临界反应半径内与随机选择的单体反应。群集单元彼此链接。然后，另一种单体被活化并且发生下一个链反应。重复该过程，直到纯净的单体在反应半径内消失或直至活化的单体彼此反应为止。模拟模型很好地描述了基本的UV固化特性，例如反应后单体的分子量分布以及引发剂浓度对转化率的影响。通过模拟还研究了膜厚度对紫外线固化特性的影响。 （C）2017日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2017年第6s1期|06GL03.1-06GL03.5|共5页
  • 作者

    Koyama Masanori; Shirai Masamitsu; Kawata Hiroaki; Hirai Yoshihiko; Yasuda Masaaki;

  • 作者单位

    Osaka Prefecture Univ, Dept Phys & Elect, Sakai, Osaka 5998531, Japan;

    Osaka Prefecture Univ, Dept Phys & Elect, Sakai, Osaka 5998531, Japan;

    Osaka Prefecture Univ, Dept Phys & Elect, Sakai, Osaka 5998531, Japan;

    Osaka Prefecture Univ, Dept Phys & Elect, Sakai, Osaka 5998531, Japan;

    Osaka Prefecture Univ, Dept Phys & Elect, Sakai, Osaka 5998531, Japan;

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