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200-mm GaN-on-Si Based Blue Light-Emitting Diode Wafer with High Emission Uniformity

机译:具有高发射均匀性的200mm硅基GaN硅基蓝色发光二极管晶圆

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摘要

We investigated the emission wavelength uniformity of 200-mm GaN-on-Si based blue light-emitting diode (LED) wafer grown by metalorganic vapor phase epitaxy (MOVPE). The larger the Si substrate diameter becomes, the more difficult to obtain uniform distribution of the emission wavelength because of the larger bow during growth, resulting in larger on-wafer inhomogeneity in growth temperature. Owing to the GaN-on-Si buffer strain management, optimized gas flow condition, and precise control of temperature balance in a reactor, we have achieved high thickness and crystal quality uniformity over the 200-mm GaN-on-Si based blue LED wafer. As a result, excellent blue photoluminescence emission wavelength uniformity from the InGaN-multi-quantum wells can be demonstrated on a 200-mm wafer with a standard deviation of 2.53 nm (0.57%). Less wavelengths binning with these highly uniform emission over the 200-mm wafer show the capability of sustainable cost reduction in LED fabrication based on GaN-on-Si technology.
机译:我们研究了通过有机金属气相外延(MOVPE)生长的200mm硅基GaN基硅基蓝色发光二极管(LED)晶片的发射波长均匀性。 Si衬底直径变得越大,由于在生长期间的弯曲越大,越难以获得发射波长的均匀分布,从而导致在生长温度下晶片上的不均匀性更大。由于GaN-on-Si缓冲应变管理,优化的气体流动条件以及反应器中温度平衡的精确控制,我们已经在200mm的GaN-on-Si基蓝色LED晶片上实现了高厚度和晶体质量均匀性。结果,可以在标准偏差为2.53 nm(0.57%)的200 mm晶片上证明InGaN多量子阱具有出色的蓝色光致发光发射波长均匀性。在200毫米晶圆上具有这些高度均匀的发射的波长合并数量更少,显示了在基于GaN-on-Si技术的LED制造中可持续降低成本的能力。

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  • 来源
    《Japanese journal of applied physics》 |2013年第8issue2期|08JB25.1-08JB25.3|共3页
  • 作者单位

    AZZURRO Semiconductors AG, Breitscheidstrasse 78, 01237 Dresden, Germany;

    AZZURRO Semiconductors AG, Breitscheidstrasse 78, 01237 Dresden, Germany;

    AZZURRO Semiconductors AG, Breitscheidstrasse 78, 01237 Dresden, Germany;

    AZZURRO Semiconductors AG, Breitscheidstrasse 78, 01237 Dresden, Germany;

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