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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >Proximity Effect in Electron-Beam-Induced Deposition
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Proximity Effect in Electron-Beam-Induced Deposition

机译：电子束诱导沉积中的邻近效应

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摘要

We studied the proximity effect in electron-beam-induced deposition (EBID), namely, the frequent deformation of deposited structures as a result of a subsequent deposition performed nearby. Our study showed that this effect largely depends on the conductivity of the substrate used, indicating that electrostatic forces are responsible for the effect. An alternate scan sequence, aimed at reducing charge accumulation during the deposition, was proposed and demonstrated. Using this scan sequence, we were able to fabricate closely separated rods. The electrostatic force responsible for the proximity effect has a scaling feature: the smaller the scale, the stronger the effect of the electrostatic force. For three-dimensional nanostructure fabrications, this feature will enforce another limitation in the size, besides the usual achievable resolution limits imposed by EBID.
机译：我们研究了电子束诱导沉积（EBID）中的邻近效应，即由于附近进行后续沉积而导致的沉积结构频繁变形。我们的研究表明，这种作用很大程度上取决于所用基材的电导率，表明静电力是造成这种作用的原因。提出并证明了另一种扫描顺序，旨在减少沉积过程中的电荷积累。使用此扫描序列，我们能够制造出紧密分离的棒。引起邻近效应的静电力具有缩放功能：缩放比例越小，静电力的效应越强。对于三维纳米结构制造，此功能将在尺寸上施加另一个限制，除了由EBID施加的通常可达到的分辨率限制外。

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