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Optimal composition of europium gallium oxide thin films for device applications

机译：器件应用中氧化镓镓薄膜的最佳组成

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摘要

Europium gallium oxide (Eu_xGa_(1-x))_2O_3 thin films were deposited on sapphire substrates by pulsed laser deposition with varying Eu content from x=2.4 to 20 mol %. The optical and physical effects of high europium concentration on these thin films were studied using photoluminescence (PL) spectroscopy, x-ray diffraction (XRD), and Rutherford backscattering spectrometry. PL spectra demonstrate that emission due to the ~5D_0 to ~7F_J transitions in Eu~(3+) grows linearly with Eu content up to 10 mol %. Time-resolved PL indicates decay parameters remain similar for films with up to 10 mol % Eu. At 20 mol %, however, PL intensity decreases substantially and PL decay accelerates, indicative of parasitic energy transfer processes. XRD shows films to be polycrystalline and beta-phase for low Eu compositions. Increasing Eu content beyond 5 mol % does not continue to modify the film structure and thus, changes in PL spectra and decay cannot be attributed to structural changes in the host. These data indicate the optimal doping for optoelectronic devices based on (Eu_xGa_(1-x))_2O_3 thin films is between 5 and 10 mol %.
机译：通过脉冲激光沉积将Eu氧化镓（Eu_xGa_（1-x））_ 2O_3薄膜沉积在蓝宝石衬底上，其Eu含量在x = 2.4到20 mol％之间变化。使用光致发光（PL）光谱，X射线衍射（XRD）和卢瑟福背散射光谱法研究了高concentration浓度对这些薄膜的光学和物理效应。 PL光谱表明，由于Eu〜（3+）中〜5D_0到〜7F_J跃迁引起的发射随着Eu含量高达10 mol％线性增长。时间分辨的PL表示Eu含量高达10 mol％的薄膜的衰减参数保持相似。然而，在20mol％时，PL强度显着降低并且PL衰减加速，这表明寄生能量转移过程。 XRD显示对于低Eu组成，薄膜为多晶和β相。 Eu含量超过5mol％不能继续改变膜结构，因此，PL光谱的变化和衰变不能归因于主体的结构变化。这些数据表明，基于（Eu_xGa_（1-x））_ 2O_3薄膜的光电器件的最佳掺杂为5至10 mol％。

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  • 来源
    《Journal of Applied Physics》 |2010年第10期|P.103111.1-103111.5|共5页
  • 作者

    P. Wellenius; E. R. Smith; S. M. LeBoeuf; H. O. Everitt; J. F. Muth;

  • 作者单位

    Department of Electrical and Computer Engineering, North Carolina State University, Raleigh, North Carolina 27695, USA;

    Kratos Defense and Security Solutions, Inc., 5030 Bradford Drive, Huntsville, Alabama 35805, USA;

    Valencell, Inc., 920 Main Campus Drive, Raleigh, North Carolina 27615, USA;

    Army Aviation and Missile RD&E Center, Redstone Arsenal, Alabama 35898, USA and Department of Physics, Duke University, Durham, North Carolina 27708, USA;

    Department of Electrical and Computer Engineering, North Carolina State University, Raleigh, North Carolina 27695, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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