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首页> 外文期刊>Journal of Crystal Growth >Investigation of strain in self-assembled multilayer InAs/GaAs quantum dot heterostructures
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Investigation of strain in self-assembled multilayer InAs/GaAs quantum dot heterostructures

机译:自组装多层InAs / GaAs量子点异质结构中的应变研究

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摘要

The self-assembled InAs/GaAs multilayer quantum dots (QDs) are formed in a strain-driven process due to the lattice mismatch of the InAs/GaAs system. We have investigated strain interaction in 10 layer QD heterostructure with varying thicknesses of combination capping (InAlGaAs and GaAs) by means of scanning transmission electron microscopy (STEM), high-resolution X-ray diffraction (HRXRD) and Raman scattering. STEM micrographs reveal nice stacking of defect-free dots in all the layers of the sample having a thick combination capping. The periodic satellite peaks in the HRXRD rocking curve show good formation of dots and an indication of reduced compressive strain in the heterostructure with increased capping thickness. We detect an upward phonon frequency shift for InAs QDs in the low-temperature Raman study, which is believed to be due to strain relaxation as the thickness of the capping layer increases. The sample with thick combination capping showed better optical emission properties.
机译:由于InAs / GaAs系统的晶格失配,在应变驱动过程中形成了自组装的InAs / GaAs多层量子点(QD)。我们已经通过扫描透射电子显微镜(STEM),高分辨率X射线衍射(HRXRD)和拉曼散射研究了10层QD异质结构中具有不同厚度的组合封盖(InAlGaAs和GaAs)的应变相互作用。 STEM显微照片显示,在具有厚组合盖的样品的所有层中,无缺陷点的良好堆积。 HRXRD摇摆曲线中的周期性卫星峰显示出良好的点形成,并表明随着封盖厚度的增加,异质结构中的压缩应变降低。我们在低温拉曼研究中检测到InAs量子点的声子频移向上,这被认为是由于覆盖层厚度增加而引起的应变松弛。具有厚的组合盖的样品显示出更好的光发射性能。

著录项

  • 来源
    《Journal of Crystal Growth》 |2010年第5期|724-729|共6页
  • 作者单位

    Centre for Nanoelectronics, Department of Electrical Engineering, Indian Institute of Technology Bombay, Mumbai 400076, India;

    Centre for Nanoelectronics, Department of Electrical Engineering, Indian Institute of Technology Bombay, Mumbai 400076, India;

    Centre for Nanoelectronics, Department of Electrical Engineering, Indian Institute of Technology Bombay, Mumbai 400076, India;

    Department of Physics and Meteorology Indian Institute of Technology Kharagpur, Kharagpur 721302, India;

    Department of Physics and Meteorology Indian Institute of Technology Kharagpur, Kharagpur 721302, India;

    Department of Chemical Engineering and Materials Science University of California-Davis, 1153 Kemper Hall, One Shields Avenue, Davis, CA 956)6, USA;

    Department of Chemical Engineering and Materials Science University of California-Davis, 1153 Kemper Hall, One Shields Avenue, Davis, CA 956)6, USA;

    Department of Chemical Engineering and Materials Science University of California-Davis, 1153 Kemper Hall, One Shields Avenue, Davis, CA 956)6, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A1. Nanostructure; A3.Molecular beam epitaxy; A3.Quantum dots; B2.Semiconducting III-V materials;

    机译:A1。纳米结构A3。分子束外延;A3。量子点B2。III-V半导体材料;

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