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首页> 外文期刊>Journal of Crystal Growth >Molecular beam epitaxy (MBE) growth of composite (In,A)As/(In,Ga)As vertically coupled quantum dots and their application in injecTIon lasers
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Molecular beam epitaxy (MBE) growth of composite (In,A)As/(In,Ga)As vertically coupled quantum dots and their application in injecTIon lasers

机译:(In,A)As /(In,Ga)As复合垂直耦合量子点的分子束外延(MBE)生长及其在注入激光器中的应用

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摘要

Injectional asers based on self-organized (In,A)As/(In,Ga)As quantum dots (QD) suffer from the gain saturation due to the limtied amount of QD states participating in lasing. In the present work, we demosntrate the direct increasle in the areal density of (In,Ga)As QDs. We used an array of (In,Al)As QDs demosntrating considerably higher density than Al-free QDs as nucleation centers for the (In,Ga)As QD formation. Finally, composte vertically coupled (In,A)As/(In,Ga)As QD s with increased areal density are formed, which is confirmed by phtoluminescence and TEM. Using the denser array of (In,A)As/(In,Ga)As QDs in the active region of injection laser leads to the increase in modal gain, reduction in threshodk current density at high mirror loss,a nd increase in maximum output power.
机译:基于自组织(In,A)As /(In,Ga)As量子点(QD)的注入asers由于参与激射的QD态的数量有限而遭受增益饱和。在当前的工作中,我们演示了(In,Ga)As QD的面密度的直接增加。我们使用了阵列的(In,Al)As QD,其密度显着高于无铝QD,作为(In,Ga)As QD形核中心。最终,形成具有增加的面密度的垂直耦合的(In,A)As /(In,Ga)As QD s,这通过光致发光和TEM证实。在注入激光的有源区域中使用密度更高的(In,A)As /(In,Ga)As QD阵列会导致模态增益的增加,镜面损耗高时阈值电流密度的减小以及最大输出的增加功率。

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