RF sputtering deposition of MgMn2</sub>O4</sub> spinel thin films

L. Malavasi; M. C. Mozzati; G. Chiodelli; C. B. Azzoni; G. Flor

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RF sputtering deposition of MgMn2O4 spinel thin films

机译：射频溅射沉积MgMn2 O4 尖晶石薄膜

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In this paper we describe about the synthesis of MgMn2O4 thin films by means of off-axis RF magnetron sputtering and their structural and morphological characterisation realised by means of X-ray diffraction (XRD), micro-Raman spectroscopy and Scanning Electron Microscopy (SEM). We explored different synthesis conditions, namely the substrate temperature, T s, and the sputtering gas composition and we could observe that well-crystallised films are obtained at T s = 500°C while the effect of the sputtering gas composition is to affect the structural properties of the films deposited. The thin films deposited always present a crystal structure less distorted with respect to the one of the target material. The possibility of synthesising films of low distorted spinels or even cubic ones may be an interesting way of preparing buffering layers for the growth of isostructural materials such as other spinels or pseudocubic perovskites.

机译：在本文中，我们描述了通过离轴RF磁控溅射合成MgMn2 O4 薄膜的方法，以及通过X射线衍射（XRD），微细衍射法实现的结构和形态表征。拉曼光谱和扫描电子显微镜（SEM）。我们探索了不同的合成条件，即衬底温度，T s 和溅射气体组成，我们可以观察到在T s = 500°C时获得了良好结晶的薄膜，而溅射气体的组成会影响所沉积薄膜的结构性能。沉积的薄膜始终具有相对于一种靶材料而言较少扭曲的晶体结构。合成低畸变尖晶石或什至立方晶状尖晶石的薄膜的可能性可能是制备缓冲层的有趣方法，该缓冲层用于生长诸如其他尖晶石或假立方钙钛矿的同质结构材料。

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《Journal of Materials Science》 |2004年第5期|1671-1675|共5页
作者
L. Malavasi; M. C. Mozzati; G. Chiodelli; C. B. Azzoni; G. Flor;
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INSTM IENI/CNR Dipartimento di Chimica Fisica “M. Rolla” Università di Pavia;

INFM Unità di Pavia and Dipartimento di Fisica “A. Volta” Università di Pavia;

Dipartimento di Chimica Fisica “M. Rolla” Università di Pavia INSTM IENI/CNR;

INFM Unità di Pavia and Dipartimento di Fisica “A. Volta” Università di Pavia;

Dipartimento di Chimica Fisica “M. Rolla” Università di Pavia INSTM IENI/CNR;

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1. RF sputtering deposition of MgMn2O4 spinel thin films [J] . Malavasi L., Mozzati MC., Chiodelli G., Journal of Materials Science . 2004,第5期

机译：射频溅射沉积MgMn2O4尖晶石薄膜
2. Low temperature sputter-deposition of Ni-Zn ferrite thin-films using electron-cyclotron-resonance microwave plasma - soft magnetic backlayer for spinel ferrite thin-film perpendicular magnetic recording media [J] . Hirofumi Wada, Setsuo Yamamoto, Hiroki Kurisu, 電子情報通信学会技術研究報告. 磁気記録. Magnetic Recording . 2002,第423期

机译：电子回旋共振微波等离子体低温溅射沉积镍锌铁氧体薄膜-尖晶石铁氧体薄膜垂直磁记录介质的软磁背层
3. Low temperature sputter-deposition of Ni-Zn ferrite thin-films using electron-cyclotron-resonance microwave plasma - soft magnetic backlayer for spinel ferrite thin-film perpendicular magnetic recording media [J] . Hirofumi Wada, Setsuo Yamamoto, Hiroki Kurisu, 電子情報通信学会技術研究報告. 磁気記録. Magnetic Recording . 2002,第423期

机译：使用电子 - 回旋 - 谐振微波等离子体 - 软磁背光用于尖晶石铁氧体薄膜垂直磁记录介质的低温溅射沉积镍铬镍薄膜
4. Checkerboard deposition of lithium manganese oxide spinel (LiMn2O4) by RF magnetron sputtering on a stainless steel in all-solid-state thin film battery [C] . T H Hsueh, Y Q Yu, D J Jan International Conference on Mechanical Engineering, Materials Science and Civil Engineering . 2018

机译：锂锰氧化物尖晶石（LiMn2O4）的棋盘沉积在全固态薄膜电池中不锈钢上的RF磁控溅射
5. The surface morphology of thin gold films deposited on silicon(001) substrates by sputter deposition. [D] . Ayoub, Sarah. 2012

机译：通过溅射沉积在硅（001）衬底上沉积的金薄膜的表面形态。
6. Correction: Growth and crystallographic feature-dependent characterization of spinel zinc ferrite thin films by RF sputtering [O] . Yuan-Chang Liang, Hao-Yuan Hsia 2014

机译：校正：射频溅射法制备尖晶石型锌铁氧体薄膜及其晶体学特征
7. High Rate Deposition of Mn-Zn Spinel Ferrite Thin Films Using Reactive Facing-Target Sputtering. [O] . Taro Kamiki, Syunsuke Saito, Kong Sok Hyun, 2003

机译：Mn-Zn尖晶石铁氧体薄膜使用反应靶溅射的高速率沉积。

RF sputtering deposition of MgMn2O4 spinel thin films

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