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首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures >Low-temperature c-axis oriented growth of nanocrystalline ZnO thin films on Si substrates by plasma assisted pulsed laser deposition
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Low-temperature c-axis oriented growth of nanocrystalline ZnO thin films on Si substrates by plasma assisted pulsed laser deposition

机译：等离子体辅助脉冲激光沉积在硅衬底上低温c轴定向生长纳米ZnO薄膜

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摘要

Nanocrystalline zinc oxide (nc-ZnO) thin films with c-axis orientation were deposited on Si (100) substrates at a temperature lower than 100 ℃ by plasma assisted pulsed laser deposition from metallic zinc. Oxygen plasma generated by electron cyclotron resonance (ECR) microwave discharge was used as a reactive and energetic source to assist reactive deposition and oriented growth of nc-ZnO thin films. Atomic force microscopy (AFM) observation revealed the smooth surface appearance of the deposited nc-ZnO films. Analysis from Raman scattering and Fourier-transform infrared spectroscopy (FTIR) demonstrated the wurtzite structure of the deposited films. Structural characterization from x-ray diffraction (XRD) analysis showed the film growth with c-axis orientation perpendicular to the substrate surface and the nanocrystalline formation with average c-axis-oriented crystallites of 12 nm. The deposited nc-ZnO films are optically transparent in the visible and near infrared regions and the optical band gap was determined to be 3.32 eV.
机译：通过等离子体辅助脉冲激光从金属锌沉积，在低于100℃的温度下，将c轴取向的纳米晶氧化锌（nc-ZnO）薄膜沉积在Si（100）衬底上。通过电子回旋共振（ECR）微波放电产生的氧等离子体用作反应性和高能源，以帮助nc-ZnO薄膜进行反应性沉积和定向生长。原子力显微镜（AFM）观察显示，沉积的nc-ZnO膜表面光滑。通过拉曼散射和傅立叶变换红外光谱（FTIR）进行的分析表明，沉积膜的纤锌矿结构。通过X射线衍射（XRD）分析进行的结构表征显示，膜的生长沿c轴方向垂直于基材表面，而纳米晶体的形成具有12 nm的平均c轴方向微晶。沉积的nc-ZnO薄膜在可见光和近红外区域是光学透明的，光学带隙确定为3.32 eV。

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