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机译:纳米压印光刻中聚合物填充过程的计算研究
Department of Physics and Electronics, Osaka Prefecture University, Sakai, Osaka 599-8531, Japan JST - CREST, Kawaguchi, Saitama 332-0012, Japan Department of Physics and Electronics, Osaka Prefecture University, Sakai. Osaka 599-8531, Japan;
Department of Physics and Electronics, Osaka Prefecture University, Sakai, Osaka 599-8531, Japan JST - CREST, Kawaguchi, Saitama 332-0012, Japan;
Department of Physics and Electronics, Osaka Prefecture University, Sakai, Osaka 599-8531, Japan JST - CREST, Kawaguchi, Saitama 332-0012, Japan;
Department of Physics and Electronics, Osaka Prefecture University, Sakai, Osaka 599-8531, Japan JST - CREST, Kawaguchi, Saitama 332-0012, Japan;
Department of Physics and Electronics, Osaka Prefecture University, Sakai, Osaka 599-8531, Japan JST - CREST, Kawaguchi, Saitama 332-0012, Japan;
Department of Physics and Electronics, Osaka Prefecture University, Sakai, Osaka 599-8531, Japan JST - CREST, Kawaguchi, Saitama 332-0012, Japan;
nanoimprint; molecular dynamics; polymer; pattern geometry;
机译:纳米压印光刻中聚合物填充过程中的分子流
机译:分子大小对纳米压印光刻胶填充工艺的影响:分子动力学研究
机译:纳米压印光刻技术中具有各种压力变化率的聚合物填充率(2015年,第131卷,第24页)
机译:双层抗蚀剂纳米压印光刻中聚合物灌装过程的计算研究
机译:聚合物纳米压印光刻的分子建模与启发式算法=聚合物纳米压缩光刻的分子建模和启发式算法
机译:使用具有各种微/纳米比的印模进行的紫外线纳米压印光刻的抗蚀剂填充研究
机译:聚合物膜厚度和腔尺寸对压花过程中聚合物流动的影响:纳米压印光刻的工艺设计规则。
机译:聚合物膜厚度和腔体尺寸对压花过程中聚合物流动的影响:纳米压印光刻的工艺设计规则