Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography

著录项

• 来源
  《Microelectronic Engineering》 |2011年第10期|p.3178-3181|共4页
• 作者

  Wenbo Jiang; Song Hu; Changqing Xie; Xiaoli Zhu; Lixin Zhao; Weicheng Xie; Jun Wang; Xiucheng Dong;

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• 作者单位

  School of Electrical and Information Engineering, Xihua University, Chengdu 610039, China ,Key Laboratory of Signal and Information Processing of Sichuan Province, Xihua University, Chengdu 610039, China;

  Institute of Optics & Electronics, Chinese Academy of Sciences, Chengdu 610209, China;

  Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;

  Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;

  Institute of Optics & Electronics, Chinese Academy of Sciences, Chengdu 610209, China;

  School of Electrical and Information Engineering, Xihua University, Chengdu 610039, China ,Key Laboratory of Signal and Information Processing of Sichuan Province, Xihua University, Chengdu 610039, China;

  School of Electrical and Information Engineering, Xihua University, Chengdu 610039, China ,Key Laboratory of Signal and Information Processing of Sichuan Province, Xihua University, Chengdu 610039, China;

  School of Electrical and Information Engineering, Xihua University, Chengdu 610039, China ,Key Laboratory of Signal and Information Processing of Sichuan Province, Xihua University, Chengdu 610039, China;

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• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  submicron photon sieve; e-beam lithography; x-ray lithography; key technique; error analysis;

  机译：亚微米光子筛;电子束光刻;X射线光刻;关键技术错误分析;