首页> 外文期刊>Microelectronic Engineering >Fabrication of a three-dimensional optical vortices phase mask for astronomy by means of electron-beam lithography
【24h】

Fabrication of a three-dimensional optical vortices phase mask for astronomy by means of electron-beam lithography

机译:利用电子束光刻技术制作天文三维光学涡旋相位掩模

获取原文
获取原文并翻译 | 示例
           

摘要

In this work, a novel three-dimensional (3D) fabrication process was used to create a series of particular phase masks for astronomical applications. These phase masks, also known as spiral phase plates (SPP), find their application in astronomy for optical vortex coronagraphy in the search of extra solar planets. The 3D profile was directly written on 2.7 mm thick polymethylmethacrylate (PMMA) slide by electron beam lithography (EBL). The effect of electron scattering on topography profile was investigated and the relationship among spatial distribution of electron beam irradiation, spot size and dosage level of irradiation were experimentally characterized. The quality of the fabricated profiles was evaluated using atomic force microscopy (AFM) technique. SPPs were then optically tested by injecting a Gaussian beam and an airy diffraction pattern obtained from a laser source comparing the optical vortices so far obtained with those drawn with numerical simulations.
机译:在这项工作中,一种新颖的三维(3D)制造工艺用于为天文应用创建一系列特殊的相位掩模。这些相位掩模也称为螺旋相位板(SPP),在光学天文学中寻找太阳旋涡冠冕时应运而生,以寻找额外的太阳行星。通过电子束光刻(EBL)将3D轮廓直接写在2.7毫米厚的聚甲基丙烯酸甲酯(PMMA)幻灯片上。研究了电子散射对形貌轮廓的影响,并通过实验表征了电子束辐照的空间分布,光斑尺寸和辐照剂量水平之间的关系。使用原子力显微镜(AFM)技术评估了制造轮廓的质量。然后,通过注入高斯光束和从激光源获得的通风衍射图样,对SPP进行光学测试,将迄今获得的旋涡与通过数值模拟得出的旋涡进行比较。

著录项

  • 来源
    《Microelectronic Engineering》 |2009年第6期|1103-1106|共4页
  • 作者单位

    CNR-INFM TASC National Laboratory, Lilit Beamline, S.S.14 Km 163.5, Area Science Park, 34012 Basovizza, Trieste, Italy;

    Department of Astronomy, University of Padua, Vicolo dell'Osservatorio 2, 35122 Padova, Italy;

    Department of Astronomy, University of Padua, Vicolo dell'Osservatorio 2, 35122 Padova, Italy;

    Department of Astronomy, University of Padua, Vicolo dell'Osservatorio 2, 35122 Padova, Italy;

    SISSA International School for Advanced Studies, Via Beirut 2, 34014 Trieste, Italy;

    CNR-INFM TASC National Laboratory, Lilit Beamline, S.S.14 Km 163.5, Area Science Park, 34012 Basovizza, Trieste, Italy;

    Department of Astronomy, University of Padua, Vicolo dell'Osservatorio 2, 35122 Padova, Italy;

    CNR-INFM TASC National Laboratory, Lilit Beamline, S.S.14 Km 163.5, Area Science Park, 34012 Basovizza, Trieste, Italy Department of Physics, University of Padua, Via F. Marzolo 8, 35131 Padova, Italy LaNN, Laboratory for Nanofabrication of Nanodevices, Veneto Nanotech, Via San Crispino 106, 35129 Padova, Italy;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    electron beam lithography; optical vortex coronagraph; diffractive optical elements;

    机译:电子束光刻;光学涡旋日冕仪;衍射光学元件;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号