机译:利用电子束光刻技术制作天文三维光学涡旋相位掩模
CNR-INFM TASC National Laboratory, Lilit Beamline, S.S.14 Km 163.5, Area Science Park, 34012 Basovizza, Trieste, Italy;
Department of Astronomy, University of Padua, Vicolo dell'Osservatorio 2, 35122 Padova, Italy;
Department of Astronomy, University of Padua, Vicolo dell'Osservatorio 2, 35122 Padova, Italy;
Department of Astronomy, University of Padua, Vicolo dell'Osservatorio 2, 35122 Padova, Italy;
SISSA International School for Advanced Studies, Via Beirut 2, 34014 Trieste, Italy;
CNR-INFM TASC National Laboratory, Lilit Beamline, S.S.14 Km 163.5, Area Science Park, 34012 Basovizza, Trieste, Italy;
Department of Astronomy, University of Padua, Vicolo dell'Osservatorio 2, 35122 Padova, Italy;
CNR-INFM TASC National Laboratory, Lilit Beamline, S.S.14 Km 163.5, Area Science Park, 34012 Basovizza, Trieste, Italy Department of Physics, University of Padua, Via F. Marzolo 8, 35131 Padova, Italy LaNN, Laboratory for Nanofabrication of Nanodevices, Veneto Nanotech, Via San Crispino 106, 35129 Padova, Italy;
electron beam lithography; optical vortex coronagraph; diffractive optical elements;
机译:用于电子束光刻的高对比度3D接近校正:一种用于制造悬浮掩模的使能技术,用于在超高压环境中完成器件制造
机译:用于单次曝光的三维光子结构全息制造的两层相掩模的纳米压印光刻
机译:通过原位光学光刻和电子束光刻相结合的确定性制造与单个量子发射器耦合的圆形布拉格光栅
机译:用于仅相位光学涡流制造的附加光刻工艺中的光刻胶粗糙度表征
机译:使用相移掩模在高数值孔径光刻中表征偏振照明。
机译:由非晶碳薄膜制造用于电子束成形的相位掩模
机译:用于电子束光刻的高对比度3D接近校正:用于制造悬挂掩模的使能技术,用于在UHV环境中完成器件制造
机译:使用光学光刻和相移掩模制造的红外频率选择表面