Nanoimprinting lithography of a two-layer phase mask for three-dimensional photonic structure holographic fabrications via single exposure

Xu D.; Chen K.P.; Ohlinger K.; Lin Y.

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Nanoimprinting lithography of a two-layer phase mask for three-dimensional photonic structure holographic fabrications via single exposure

机译：用于单次曝光的三维光子结构全息制造的两层相掩模的纳米压印光刻

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We report a combined holographic and nanoimprinting lithography technique to produce three-dimensional woodpile photonic crystal templates through only one single exposure. The interference lithography process uses an integratable diffractive optical element for large throughout 3D pattern manufacturing. The diffractive optical element consists of two layers of phase grating separated by an intermediate layer, fabricated by repeated nanoimprinting lithography, followed by an SU8 photoresist bonding technique. Grating periods, relative orientation, diffraction angle, and efficiency, as well as layer to layer phase delay, are well designed during manufacturing. By thermally optimizing the thickness of the intermediate layer, this paper demonstrates the fabrication of interconnected 3D photonic structures with arbitrary symmetry through a single laser exposure. The two-layer phase mask approach enables a CMOS-compatible monolithic integration of 3D photonic structures with other integrated optical elements and waveguides.

机译：我们报告全息和纳米压印光刻技术相结合，以仅通过一次曝光即可产生三维木桩光子晶体模板。干涉光刻工艺使用可集成的衍射光学元件进行大型3D图案制造。衍射光学元件由通过中间纳米层隔开的两层相位光栅组成，该中间层是通过重复的纳米压印光刻技术以及随后的SU8光致抗蚀剂粘合技术制成的。光栅周期，相对取向，衍射角和效率以及层与层的相位延迟在制造过程中进行了精心设计。通过热优化中间层的厚度，本文演示了通过一次激光曝光以任意对称性互连3D光子结构的制造过程。两层相位掩模方法可实现3D光子结构与其他集成光学元件和波导的CMOS兼容单片集成。

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《Nanotechnology》 |2011年第3期|共6页
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Xu D.; Chen K.P.; Ohlinger K.; Lin Y.;
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1. Nanoimprinting lithography of a two-layer phase mask for three-dimensional photonic structure holographic fabrications via single exposure [J] . Xu D., Chen K.P., Ohlinger K., Nanotechnology . 2011,第3期

机译：用于单次曝光的三维光子结构全息制造的两层相掩模的纳米压印光刻
2. Proposed single-exposure holographic fabrication of microsphere-type photonic crystals through phase-mask techniques [J] . Y. Lin, P. R. Herman, E. L. Abolghasemi Journal of Applied Physics . 2005,第9期

机译：通过相掩膜技术提议的微球型光子晶体的单曝光全息照相制造
3. Design and holographic fabrication of tetragonal and cubic photonic crystals with phase mask: toward the mass-production of three-dimensional photonic crystals [J] . Y. Lin, P. R. Herman, K. Darmawikarta Applied Physics Letters . 2005,第7期

机译：具有相掩膜的四方和立方光子晶体的设计和全息制造：向三维光子晶体的批量生产迈进
4. FABRICATION OF TWO-LAYER INTEGRATED PHASE MASK AND SINGLE-BEAM, SINGLE EXPOSURE FABRICATION OF 3D PHOTONIC CRYSTAL TEMPLATE USING THE MASK [C] . Yuankun Lin, Ahmad Harb, Daniel Rodriguez, International Congress on Applications of Lasers Electro-Optics . 2008

机译：使用掩模的3D光子晶体模板的两层综合相位掩模和单束，单射线曝光制造的制造
5. Laser holographic fabrication of three-dimensional photonic crystal templates using advanced phase mask techniques [D] . Xu, Di 2010

机译：使用先进的相位掩膜技术对三维光子晶体模板进行激光全息制造
6. The polarization modulation and fabrication method of two dimensional silica photonic crystals based on UV nanoimprint lithography and hot imprint [O] . Shuai Guo, Chunhui Niu, Liang Liang, -1

机译：基于UV纳米压印光刻和热压印的二维二氧化硅光子晶体的偏振调制与制备方法
7. Fabrication of two-layer integrated phase mask for single-beam and single-exposure fabrication of three-dimensional photonic crystal [O] . Lin Y, Harb A, Rodriguez D, 2008

机译：二维光子晶体单束单曝光两层集成相位掩模的制作

Nanoimprinting lithography of a two-layer phase mask for three-dimensional photonic structure holographic fabrications via single exposure

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