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首页> 美国卫生研究院文献>Scientific Reports >The polarization modulation and fabrication method of two dimensional silica photonic crystals based on UV nanoimprint lithography and hot imprint
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The polarization modulation and fabrication method of two dimensional silica photonic crystals based on UV nanoimprint lithography and hot imprint

机译：基于UV纳米压印光刻和热压印的二维二氧化硅光子晶体的偏振调制与制备方法

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摘要

Based on a silica sol-gel technique, highly-structurally ordered silica photonic structures were fabricated by UV lithography and hot manual nanoimprint efforts, which makes large-scale fabrication of silica photonic crystals easy and results in low-cost. These photonic structures show perfect periodicity, smooth and flat surfaces and consistent aspect ratios, which are checked by scanning electron microscopy (SEM) and atomic force microscopy (AFM). In addition, glass substrates with imprinted photonic nanostructures show good diffraction performance in both transmission and reflection mode. Furthermore, the reflection efficiency can be enhanced by 5 nm Au nanoparticle coating, which does not affect the original imprint structure. Also the refractive index and dielectric constant of the imprinted silica is close to that of the dielectric layer in nanodevices. In addition, the polarization characteristics of the reflected light can be modulated by stripe nanostructures through changing the incident light angle. The experimental findings match with theoretical results, making silica photonic nanostructures functional integration layers in many optical or optoelectronic devices, such as LED and microlasers to enhance the optical performance and modulate polarization properties in an economical and large-scale way.
机译：基于二氧化硅溶胶-凝胶技术，通过紫外光刻和热手动纳米压印技术制造了结构高度有序的二氧化硅光子结构，这使二氧化硅光子晶体的大规模制造变得容易，并且导致低成本。这些光子结构显示出完美的周期性，光滑和平坦的表面以及一致的纵横比，可通过扫描电子显微镜（SEM）和原子力显微镜（AFM）进行检查。此外，具有压印光子纳米结构的玻璃基板在透射和反射模式下均显示出良好的衍射性能。此外，5 nm金纳米粒子涂层可以提高反射效率，而不会影响原始的压印结构。压印二氧化硅的折射率和介电常数也接近纳米器件中的介电层的折射率和介电常数。另外，反射光的偏振特性可以通过改变入射光角度而通过条纹纳米结构来调节。实验结果与理论结果相符，使二氧化硅光子纳米结构在许多光学或光电器件（例如LED和微激光器）中具有功能性集成层，从而以经济且大规模的方式增强光学性能并调节偏振特性。

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