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首页> 外文期刊>Microelectronic Engineering >Wafer to wafer nano-imprinting lithography with monomer based thermally curable resin
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Wafer to wafer nano-imprinting lithography with monomer based thermally curable resin

机译：基于单体的可热固化树脂对晶片的纳米压印光刻

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摘要

Nano-imprinting lithography is one of the most promising key technologies for mass production of devices with nano-sized patterns. It is regarded as a tool for the next generation lithography (NGL). In this study, a thermally curable monomer solution was used for the imprinting process in order to lower imprinting pressure and temperature. A unique pressure vessel type imprinting system was used to imprint patterns as small as 150 nm over a whole 6 in. diameter wafer at a relatively low temperature (80℃) and pressure (20 atm). Near zero residual layer under the trenches was successfully demonstrated over the whole 6 in. active area.
机译：纳米压印光刻技术是大规模生产具有纳米尺寸图案的器件的最有前途的关键技术之一。它被视为下一代光刻（NGL）的工具。在这项研究中，热固性单体溶液用于压印过程，以降低压印压力和温度。独特的压力容器式压印系统用于在相对较低的温度（80℃）和压力（20 atm）下在整个6英寸直径的晶圆上压印小至150 nm的图案。在整个6英寸有效面积上，沟槽下方的残余层几乎为零。

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