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首页> 外文期刊>Optical engineering >Reflectivity and surface roughness of multilayer-coated substrate recovery layers for EUV lithographic optics
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Reflectivity and surface roughness of multilayer-coated substrate recovery layers for EUV lithographic optics

机译：用于EUV光刻光学的多层镀膜基底恢复层的反射率和表面粗糙度

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摘要

We investigated the use of separation, or substrate recovery, layers (SRLs), to enable the reuse of optical substrates after the deposition of multilayer reflective coatings, in particular Mo/Si multilayers as used for EUV lithography. An organic material (polyimide), known from other work to reduce the roughness of the substrate, was applied to the optical substrate. It appeared to be possible to remove the multilayer coating, including the SRL, without any damage or roughening of the substrate surface. The SRL was spin-coated at 1500 to 6000 rpm on different substrate types (Si, quartz, Zerodur) with diameters up to 100 mm. For this range of parameters, the multilayer centroid wavelength value remained unchanged, and its reflectivity loss on applying the SRL was limited typically to 0.7%. The latter was shown to be caused by a minor increase of the SRL surface roughness in the high-spatial-frequency domain. The roughness, characterized with an atomic force microscope, remained constant at 0.2 nm during all stages of the substrate recovery process, independent of the initial substrate roughness.
机译：我们研究了分离或衬底恢复层（SRL）的使用，以便在沉积多层反射涂层（尤其是用于EUV光刻的Mo / Si多层）后，可以重新使用光学衬底。从其他工作中已知的用于减小基板粗糙度的有机材料（聚酰亚胺）被施加到光学基板上。似乎可以去除多层涂层，包括SRL，而不会损坏或粗糙基材表面。 SRL以1500至6000 rpm的转速旋涂在直径最大为100 mm的不同类型的基板（Si，石英，Zerodur）上。对于此参数范围，多层质心波长值保持不变，并且在应用SRL时其反射率损失通常限制为0.7％。后者被证明是由高空间频率域中SRL表面粗糙度的微小增加引起的。用原子力显微镜表征的粗糙度在基材回收过程的所有阶段均保持恒定在0.2 nm，与初始基材粗糙度无关。

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  • 来源
    《Optical engineering》 |2008年第6期|063801.1-063801.5|共5页
  • 作者

    lleana Nedelcu; Robbert W. E. van de Kruijs; Andrey E. Yakshin; Gisela von Blanckenhagen; Fred Bijkerk;

  • 作者单位

    FOM-Institute for Plasma Physics Rijnhuizen P.O. Box. 1207 3430 BE Nieuwegein, The Netherlands;

    FOM-Institute for Plasma Physics Rijnhuizen P.O. Box. 1207 3430 BE Nieuwegein, The Netherlands;

    FOM-Institute for Plasma Physics Rijnhuizen P.O. Box. 1207 3430 BE Nieuwegein, The Netherlands;

    Carl Zeiss SMT AG LIT-OCE D-73446 Oberkochen, Germany;

    FOM-Institute for Plasma Physics Rijnhuizen P.O. Box. 1207 3430 BE Nieuwegein, The Netherlands;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    substrate recovery; spin coating; roughness; multilayer;

    机译：底物回收;旋涂粗糙度多层的;

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