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机译:位移损坏和总电离剂量对4H-SiC功率器件的影响
Czech Tech Univ Fac Elect Engn Dept Microelect Tech 2 Prague 16627 6 Czech Republic;
silicon compounds; carrier lifetime; Schottky diodes; wide band gap semiconductors; hydrogen; radiation hardening (electronics); ionisation; power MOSFET; power semiconductor switches; lightly doped drift regions; carrier mobility; unipolar devices; blocking characteristics; bipolar devices; shorter carrier diffusion lengths; forward voltage drop; metal-oxide-semiconductor field-effect transistors; power diodes; high-energy particles; device characteristics; displacement damage; total ionisation dose effects; power transistors; radiation defects; degradation mechanisms; acceptor traps; forward voltage; conductivity modulation; charge sensitive oxide layer; junction barrier Schottky diode; JFET; radiation-resistant silicon carbide power devices; H-SiC;
机译:MoS 2 sub>-层间-MoS 2 sub>隧道结的总电离剂量效应和质子诱导的位移损伤
机译:由于总电离剂量和位移损坏影响,CBRAM中的故障阈值
机译:微电子学中的总电离剂量和位移-损伤效应
机译:质子诱导的总电离剂量和位移损伤对UC1708功率驱动器的影响
机译:SiGe PMOS器件上的总电离剂量辐射效应和负偏置温度不稳定性
机译:高效率保护的4H-SIC动力装置CFM-JTE的表征和制造及JTE剂量耐受窗口
机译:静态和动态条件下半导体功率器件上总电离剂量效应的研究。静态和动态条件下电离辐射总剂量对半导体功率器件的影响研究