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首页> 外文期刊>Proceedings of the IEEE >Evolution of the MOS transistor-from conception to VLSI
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Evolution of the MOS transistor-from conception to VLSI

机译:MOS晶体管的发展-从概念到VLSI

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摘要

Historical developments of the metal-oxide-semiconductor field-effect transistor (MOSFET) during the last 60 years are reviewed, from the 1928 patent disclosures of the field-effect conductivity modulation concept and the semiconductor triode structures proposed by Lilienfeld to the 1947 Shockley-originated efforts which led to the laboratory demonstration of the modern silicon. MOSFET in 1960. A survey is then made of the milestones of the past 30 years leading to the latest submicron silicon logic CMOS (complementary MOS) and BICMOS (bipolar-junction transistor CMOS combined) arrays and the three-dimensional and ferroelectric extensions of Dennard's one-transistor dynamic random access memory (DRAM) cell. The status of the submicron lithographic technologies is summarized. Future trends of memory cell density and logic gate speed are projected. Comparisons of the switching speed of the silicon MOSFET with that of silicon bipolar and GaAs field-effect transistors are reviewed. The use of high-temperature superconducting wires and GaAs-on-Si monolithic semiconductor optical clocks to break the interconnect-wiring delay barrier is discussed.
机译:从1928年Lilienfeld提出的场效应电导率调制概念和半导体三极管结构的专利披露到1947年Shockley-Chemistry,回顾了过去60年来金属氧化物半导体场效应晶体管(MOSFET)的历史发展。发起了许多努力,最终导致了现代硅的实验室演示。 MOSFET在1960年。然后对过去30年的里程碑进行了调查,这些里程碑导致了最新的亚微米硅逻辑CMOS(互补MOS)和BICMOS(结合了双极结晶体管CMOS)阵列以及Dennard的三维和铁电扩展单晶体管动态随机存取存储器(DRAM)单元。总结了亚微米光刻技术的现状。预测了存储单元密度和逻辑门速度的未来趋势。综述了硅MOSFET与硅双极型和GaAs场效应晶体管的开关速度的比较。讨论了使用高温超导线和GaAs-on-Si单片半导体光学时钟来打破互连布线延迟的障碍。

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