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首页> 外文期刊>Review of Scientific Instruments >Atomic force microscopy deep trench and sidewall imaging with an optical fiber probe
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Atomic force microscopy deep trench and sidewall imaging with an optical fiber probe

机译：原子力显微镜用光纤探头对深沟槽和侧壁成像

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摘要

We report a method to measure critical dimensions of micro- and nanostructures using the atomic force microscope (AFM) with an optical fiber probe (OFP). This method is capable of scanning narrow and deep trenches due to the long and thin OFP tip, as well as imaging of steep sidewalls with unique profiling possibilities by laterally tilting the OFP without any modifications of the optical lever. A switch control scheme is developed to measure the sidewall angle by flexibly transferring feedback control between the Z- and Y-axis, for a serial scan of the horizontal surface (raster scan on XY-plane) and sidewall (raster scan on the YZ-plane), respectively. In experiments, a deep trench with tapered walls (243.5 μm deep) and a microhole (about 14.9 μm deep) have been imaged with the orthogonally aligned OFP, as well as a silicon sidewall (fabricated by deep reactive ion etching) has been characterized with the tilted OFP. Moreover, the sidewall angle of TGZ3 (AFM calibration grating) was accurately measured using the switchable scan method.
机译：我们报告了一种使用原子力显微镜（AFM）和光纤探针（OFP）来测量微观和纳米结构的关键尺寸的方法。该方法能够扫描由于长而薄的OFP尖端而导致的狭窄和深沟槽，以及通过横向倾斜OFP而无需对光学杆进行任何修改即可对陡峭的侧壁进行成像，并具有独特的轮廓分析可能性。开发了一种开关控制方案，通过灵活地在Z轴和Y轴之间传递反馈控制来测量侧壁角度，以便对水平面进行串行扫描（在XY平面上进行光栅扫描）和对侧壁进行串行扫描（在YZ-上进行光栅扫描）平面）。在实验中，已使用正交排列的OFP对具有锥形壁（深243.5μm）和微孔（深14.9μm）的深沟槽进行了成像，并且对硅侧壁（通过深反应离子刻蚀制造）进行了表征。倾斜的OFP。此外，使用可切换扫描方法精确测量了TGZ3（AFM校准光栅）的侧壁角度。

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