首页> 外文期刊>Solid-State Electronics >Analysis of two-dimensional effects on subthreshold current in submicron MOS transistors
【24h】

Analysis of two-dimensional effects on subthreshold current in submicron MOS transistors

机译:亚微米MOS晶体管对亚阈值电流的二维影响分析

获取原文
获取原文并翻译 | 示例
           

摘要

In short channel devices, the dependence of subthreshold current on drain induced barrier lowering, substrate bias, channel length, and temperature is modeled. NMOS devices down to effective channel length of 0.13 μm are considered. The model, based on drift-diffusion theory, accurately predicts such dependence as verified by results obtained using This model when compared with those obtained with numerical device simulators.
机译:在短沟道器件中,亚阈值电流对漏极引起的势垒降低,衬底偏置,沟道长度和温度的依赖性得到了建模。考虑了有效沟道长度低至0.13μm的NMOS器件。该模型基于漂移扩散理论,与使用数值设备模拟器获得的结果相比,可以准确预测这种依赖性,该依赖性已得到使用此模型获得的结果的验证。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号