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Subthreshold current for submicron LDD MOS transistor

机译:亚微米LDD MOS晶体管的亚阈值电流

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For LDD devices, the voltage drop in the lightly doped, n/sup -/ region will strongly affect the subthreshold current, and must be modeled accurately. The assumptions that the entire drain-source voltage drops across the drain-channel junction and that the channel is independent of V/sub DS/ no longer hold. This paper models the subthreshold current for nMOS device down to effective channel length of 0.6 /spl mu/m, based on drift-diffusion theory, taking into account the DIBL effects. The results are compared with experimental data for submicrometer nMOS devices.
机译:对于LDD器件,轻掺杂n / sup-/区域中的电压降会严重影响亚阈值电流,因此必须进行准确建模。整个漏极-源极电压在漏极-沟道结两端均下降并且该沟道与V / sub DS /无关的假设不再成立。本文基于漂移扩散理论,考虑了DIBL效应,对nMOS器件的亚阈值电流进行了建模,直至有效沟道长度为0.6 / spl mu / m。将结果与亚微米nMOS器件的实验数据进行比较。

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