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Buffer layer free large area bi-layer graphene on SiC(0001)

机译:SiC(0001)上无缓冲层的大面积双层石墨烯

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摘要

The influence of hydrogen exposures on monolayer graphene grown on the silicon terminated SiC(0001) surface is investigated using photoelectron spectroscopy (PES), low-energy electron microscopy (LEEM) and micro low-energy electron diffraction (μ-LEED). Exposures to ionized hydrogen are shown to have a pronounced effect on the carbon buffer (interface) layer. Exposures to atomic hydrogen are shown to actually convert/transform the monolayer graphene plus carbon buffer layer to bi-layer graphene, i.e. to produce carbon buffer layer free bi-layer graphene on SiC(0001). This process is shown to be reversible, so the initial monolayer graphene plus carbon buffer layer situation is recreated after heating to a temperature of about 950 ℃. A tentative model of hydrogen intercalation is suggested to explain this single to bi-layer graphene transformation mechanism. Our findings are of relevance and importance for various potential applications based on graphene-SiC structures and hydrogen storage.
机译:使用光电子能谱(PES),低能电子显微镜(LEEM)和微低能电子衍射(μ-LEED)研究了氢暴露对生长在硅终止SiC(0001)表面上的单层石墨烯的影响。暴露在离子化氢中对碳缓冲层(界面)具有显着影响。显示出暴露于原子氢实际上将单层石墨烯加碳缓冲层转化/转化为双层石墨烯,即在SiC(0001)上产生不含碳缓冲层的双层石墨烯。该过程显示为可逆的,因此在加热至约950℃的温度后,会重新产生初始的单层石墨烯加碳缓冲层的情况。建议使用氢插入的暂定模型来解释这种单层至双层石墨烯的转化机理。我们的发现对于基于石墨烯-SiC结构和储氢的各种潜在应用具有重要意义。

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