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机译:SiC(0001)上无缓冲层的大面积双层石墨烯
Department of Physics, Chemistry and Biology, Linkoeping University, S-581 83 Linkoeping, Sweden;
Maxlab, Lund University, S-22100 Lund, Sweden;
Department of Physics, Chemistry and Biology, Linkoeping University, S-581 83 Linkoeping, Sweden;
Department of Physics, Chemistry and Biology, Linkoeping University, S-581 83 Linkoeping, Sweden;
graphene; bi-layer; epitaxial; silicon carbide; LEEM; PES; hydrogenation; LEED;
机译:通过钙和镁插入缓冲层-SiC(0001)界面,独立N-掺杂的石墨烯
机译:通过水蒸气中的界面氧化在SiC(0001)上形成无缓冲层的石墨烯
机译:6H-SiC(0 0 0 1)上的大型均质单层/双层石墨烯和消除缓冲层
机译:4H-SiC(0001),(0001)和4H-SiC:H表面上物理吸附和化学吸附的单石墨烯层的密度泛函模拟
机译:探索金属基底上分子吸附剂的性能:扫描隧道显微镜研究胺在金(111)和石墨烯纳米岛上吸附的钴(0001)。
机译:离轴SiC(0001)上外延三层石墨烯的高电子迁移率
机译:通过钙和镁插入缓冲层-SiC(0001)界面独立N-掺杂的石墨烯