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Large homogeneous mono-/bi-layer graphene on 6H-SiC(0 0 0 1) and buffer layer elimination

机译:6H-SiC(0 0 0 1)上的大型均质单层/双层石墨烯和消除缓冲层

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摘要

In this paper we discuss and review results of recent studies of epitaxial growth of graphene on silicon carbide. The presentation is focused on high quality, large and uniform layer graphene growth on the SiC(0 0 0 1) surface and the results of using different growth techniques and parameters are compared. This is an important subject because access to high-quality graphene sheets on a suitable substrate plays a crucial role for future electronics applications involving patterning. Different techniques used to characterize the graphene grown are summarized. We moreover show that atomic hydrogen exposures can convert a monolayer graphene sample on SiC(0 0 0 1) to bi-layer graphene without the carbon buffer layer. Thus, a new process to prepare large, homogeneous stable bi-layer graphene sheets on SiC(0 0 0 1) is presented. The process is shown to be reversible and should be very attractive for various applications, including hydrogen storage.
机译:在本文中,我们讨论和回顾了石墨烯在碳化硅上外延生长的最新研究结果。演讲集中于在SiC(0 0 0 1)表面上高质量,大且均匀的石墨烯生长,并比较了使用不同生长技术和参数的结果。这是一个重要的主题,因为在合适的基材上获得高质量的石墨烯片对于涉及图案的未来电子应用起着至关重要的作用。总结了用于表征生长的石墨烯的不同技术。此外,我们显示原子氢暴露可以将SiC(0 0 0 1)上的单层石墨烯样品转换为没有碳缓冲层的双层石墨烯。因此,提出了一种在SiC(0 0 0 1)上制备大的均匀稳定的双层石墨烯片的新方法。事实证明该过程是可逆的,并且对于包括氢存储在内的各种应用应具有很大的吸引力。

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